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Apparatus-for-and-a-method-of-modifying-the-properties-of-a-material

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Apparatus for and a method of modifying the properties of a material

Details

Inventors: Colligon, John S.; Hill, Arthur E.; Kheyrandish, Hamid;
Assignee: University of Salford (Salford, GB2)
Primary Examiner: Demers; Arthur P.
Assistant Examiner:
Attorney, Agent or Firm: Fiddler & Levine

Apparatus for and a method of modifying the properties of a material. A single ion beam from a source in a vacuum chamber is deflected by an electrostatic deflection system between a target and a substrate. When on the target, the beam sputters material therefrom on to the substrate. When on the substrate the beam bombards material previously deposited on it from the target which mixes it with the material of the substrate. A modified surface layer may therefore be achieved. The target and substrate may be moved relative to the beam if desired and the process may be monitored and controlled using appropriate sensors and controls.

DETAILED DESCRIPTION What is claimed is: 1.
Apparatus for modifying the properties of a substrate material, said apparatus comprising: a particle beam source; substrate mounting means supporting a substrate at a position spaced from said particle beam source; target mounting means at a position spaced from both said substrate mounting means and said particle beam source; and means for producing relative movement of the particle beam from said source between said target supporting means and said substrate supporting means, whereby a particle beam from said source may impinge upon a target supported by said target supporting means to displace material therefrom onto a substrate supported by said substrate supporting means and impinge upon the substrate to intermix displaced target material with the substrate.
2.
Apparatus as in claim 1 in which said particle beam source comprises a source of ions.
3.
Apparatus as in claim 1 in which said means for producing relative movement comprises means for moving the target supported by said target moving means.
4.
Appartatus as in claim 1 in which said means for producing relative movement comprises means for moving the substrate supported on said substrate supporting means.
5.
Apparatus as in claim 1 in which said means for producing relative movement comprises means for deflecting the particle beam produced by said particle beam source.
6.
Apparatus as in claim 1, in which said target mounting means comprises means for mounting a plurality of targets of different materials.
7.
Apparatus as in claim 6, in which said target mounting means comprises means for moving one target as a time into the path of the beam.
8.
Apparatus as in claim 1, in which a sensor is provided monitoring substrate treatment.
9.
Apparatus as in claim 1, in which said substrate mounting means comprises: a carousel which can accommodate a plurality of substrates; and means for moving the carousel to bring individual substrates sequentially into a position in the path of the beam

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