 Method for planning/controlling robot motion |
| In view of the above, the present invention, through one or more of its various aspects and/or ... |
|
| Intelligent system for generating and executing a sheet metal bending plan |
| In view of the above, the present invention, through one or more of its various aspects and/or ... |
|
| Method for planning/controlling robot motion |
| In view of the above, the present invention, through one or more of its various aspects and/or ... |
|
| Method and apparatus for a thermal protection unit |
| What is claimed is: 1. An apparatus for managing operations of a circuit which executes a sequence ... |
|
| Electric power system protection and control system |
| It is an object of the present invention to provide a system which performs correlation processing ... |
|
| Distributed logic in multiple protective relays |
| The present invention overcomes the disadvantages of prior solutions, and achieves additional ... |
|
| Portable flat display adaptor |
| OF THE INVENTION Preferred embodiments of the invention applying a device adaptor to a generic F... |
|
|
Method and apparatus for monitoring and controlling imaging in immersion lithography systems
| Details |
Inventors: Levinson, Harry J.;
Assignee: Advanced Micro Devices, Inc. (Sunnyvale, CA)
Primary Examiner: Toatley, Jr.; Gregory J.
Assistant Examiner: Merlino; Amanda
Attorney, Agent or Firm: Renner, Otto, Boisselle & Sklar, LLP
A method of monitoring an immersion lithography system in which a wafer can be immersed in a liquid immersion medium. The method detects an index of refraction of the immersion medium in a volume of the immersion medium through which an exposure pattern is configured to traverse and determines if the index of refraction is acceptable for exposing the wafer with the exposure pattern. Also disclosed is a monitoring and control system for an immersion lithography system. |
|
DETAILED DESCRIPTION What is claimed is: 1.
A method of monitoring an immersion lithography system, comprising: immersing at least a portion of a wafer to be exposed in a liquid immersion medium; detecting an index of refraction of the immersion medium in a volumetric portion of the immersion medium through which an exposure pattern is configured to traverse; and determining if the index of refraction is acceptable for exposing the wafer with the exposure pattern by determining i) if the index of refraction is uniform across the traversal volume, ii) if the index of refraction in the traversal volume is within an acceptable range, or iii) both i) and ii).
2.
The method according to claim 1, wherein the determining includes determining if the index of refraction is uniform from a first location in the traversal volume to a second location in the traversal volume.
3.
The method according to claim 1, wherein the determining includes correlating a measured index of refraction at a measurement device wavelength to an exposure index of refraction at a wavelength of the exposure pattern.
4.
The method according to claim 1, wherein the index of refraction is measured throughout the traversal volume.
5.
The method according to claim 4, wherein the index of refraction is measured with an interferometer assembly.
6.
The method according to claim 5, wherein multiple beams are used to measure the index of refraction throughout the traversal volume.
7.
The method according to claim 5, wherein at least one beam is scanned through the traversal volume to measure the index of refraction throughout the traversal volume.
8.
The method according to claim 4, wherein the determining includes determining if the index of refraction is uniform from a first location in the traversal volume to a second location in the traversal volume.
9.
The method according to claim 1, further comprising controlling the immersion lithography system to defer exposing the wafer if the index of refraction is determined to be unacceptable
|
| Related patents |
|
|
Device for detecting hydrogen concentration and method of detecting hydrogen concentration
It is, therefore, an object of the present invention to provide a device, for detecting hydrogen concentration, which provides high precision detection and a method ...
|
|
|
Segmented bargraph display by an electrochromic display device
The present invention relates to an electrochromic display device for displaying an analog value in a bargraph fashion. The present invention relates, more particularly, ...
|
|
|
Microcomputer with a detecting function of a memory access error
It is therefore an object of the present invention to provide a microcomputer with a memory for storing instructions, in which a memory access error can be easily ...
|
|
|
Semiconductor intergrated circuit device
An object of the present invention is to provide a semiconductor integrated circuit device which can eliminate the above-mentioned drawbacks and disadvantages and which ...
|
|
|
Pipelined data processing device having improved hardware control over an arithmetic operations unit
A first object of the present invention is to provide a data processing device for effectively controlling and managing a pipeline of an arithmetic operation conducted ...
|
|
|
Clock generator circuitry
In accordance with one embodiment of the principles of the present invention, clock generation circuitry is disclosed which includes an oscillator for generating a first ...
|
|
|
Ultra-modular processor in lattice topology
The objects of the present invention are realized in miniaturized self-contained hot-pluggable and physically dismountable computing system herein called a Modular O...
|
|
|
Expert system for automically generating gear designs
This invention solves the shortcomings of the current process and provides other advantages. The process can be used in the conceptual stage of gear design, before ...
|
|
|
Automated three-dimensional precision coatings application apparatus
What is claimed is: 1. A precision coating apparatus, comprising: an articulated robot arm having a coating applicator mounted thereon, responsive to an arm control ...
|
|
|
Design verification apparatus
Therefore, an object of the present invention is to provide an industrial product design verification apparatus whereby omissions in the design verification process are ...
|
|
|
Control Computers 
