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Refractive index system monitor and control for immersion lithography
| Details |
Inventors: Phan, Khoi A.; Rangarajan, Bharath; Singh, Bhanwar; Subramanian, Ramkumar;
Assignee: Advanced Micro Devices, LLP (Sunnyval, CA)
Primary Examiner: Pert; Evan
Assistant Examiner: Geyer; Scott B.
Attorney, Agent or Firm: Amin & Turocy, LLP
A system and/or method are disclosed for measuring and/or controlling refractive index (n) and/or lithographic constant (k) of an immersion medium utilized in connection with immersion lithography. A known grating structure is built upon a substrate. A refractive index monitoring component facilitates measuring and/or controlling the immersion medium by utilizing detected light scattered from the known grating structure. |
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DETAILED DESCRIPTION The following presents a simplified summary of the invention in order to provide a basic understanding of some aspects of the invention.
This summary is not an extensive overview of the invention.
It is intended to neither identify key or critical elements of the invention nor delineate the scope of the invention.
Its purpose is merely to present some concepts of the invention in a simplified form as a prelude to the more detailed description that is presented later.
The present invention provides a system and method for monitoring and/or controlling refractive index and lithographic constant values of an immersion medium.
An immersion medium in accordance with the invention can occupy a gap between a final optical component and a substrate, and have a refractive index greater than air.
Furthermore, according to another aspect of the present invention, the immersion medium can be 100% transparent to an exposure wavelength.
Additionally, the immersion medium can be water, supercritical fluid in gaseous phase, ozone vapor, etc.
A known grating structure is constructed upon the substrate a refractive index monitoring component emits an incident beam that interacts with the immersion medium and the known grating structure upon the substrate to produce a reflected and/or diffracted beam(s).
The reflected and/or diffracted beam is analyzed to derive characteristics of the immersion medium such as, for example refractive index (n) and lithographic constant (k) values.
According to an aspect of the present invention, the refractive index monitoring component can effectuate changes in refractive index and/or lithographic constant of the immersion medium by means of varying temperature, pressure, flushing the immersion medium, etc.
Another aspect of the present invention provides a system for measuring and/or controlling refractive index of an immersion medium.
The system includes a refractive index monitoring component comprising a measuring component and a control component
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