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Fuel Cells

Phase-shifting-mask-and-process-for-forming

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Phase shifting mask and process for forming

Details

Inventors: Pierrat, Christophe; Rolfson, J. Brett;
Assignee: Micron Technology, Inc. (Boise, ID)
Primary Examiner: Rosasco; S.
Assistant Examiner:
Attorney, Agent or Firm: Howrey Simon Arnold & White, LLP

A phase shifting mask can be used with exposure lights of two different wavelengths. The depth of the phase shifting layer is calculated and fabricated such that it shifts a first exposure light about 180.degree. and a second exposure light about 180.degree..

DETAILED DESCRIPTION The present invention provides a phase shifting photomask that can be used with steppers having different wave lengths of exposure light.
The present invention also provides a method for designing such a phase shifting photomask.
In a preferred embodiment of the present invention, a phase shifting mask layout is designed and etched using conventional techniques.
The depth of the etch for the phase shifting portion is calculated and etched such that exposure light of two different wavelengths will each have a phase shift of about 180.
degree.
.

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