Wafer rinsing apparatus

DETAILED DESCRIPTION The present invention aims at providing a wafer rinsing apparatus improved to reduce dusts as described above.
The present invention also aims at providing a wafer rinsing apparatus improved to prevent dusts of particles from being jetted onto the wafer.
A wafer rinsing apparatus according to one aspect of the present invention includes an ice making hopper for making ice particles by heat exchange between fine droplets of liquid to be frozen and low-temperature liquefied gas.
Connected to the above-described ice hopper is a separation means for separating the above-described ice particles and liquefied gas generated from the above-described low-temperature liquefied gas.
The apparatus includes jetting means for jetting the above ice particles separated by the above separation means onto the wafer to rinse the surface of the wafer.
According to a preferred embodiment of the present invention, the above-described separation means includes a cyclone.
A wafer rinsing apparatus according to another aspect of the present invention includes an ice making hopper for making ice particles by heat treatment between fine droplets of liquid to be frozen and low-temperature liquefied gas.
Attached to the above ice making hopper is a liquid to be frozen supplying means for supplying the above fine droplets of the above liquid to be frozen to the ice making hopper.
Attached to the above ice making hopper is a filter means for removing particles included in the above low-temperature liquefied gas supplied to the ice making hopper.
The above filter means is coupled to a supply piping for supplying the low-temperature liquefied gas to the above ice making hopper with the filter means provided therebetween.
The apparatus includes a jetting means for jetting the above ice particles formed by the above ice making hopper onto the wafer.
The apparatus further includes a cooling means for externally cooling the above filter means and the above supply piping down to the liquefidation temperature of the above low-temperature liquefied gas