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 Electrophotographic element with silicide treated porous Al.sub.2 O.sub.3 sublayer

Details
Inventors: Kumano, Masafumi; Shindoh, Yasuyuki; Sano, Yutaka; Haga, Koichi; Fuse, Akihiro;
Assignee: Ricoh Co., Ltd. (Tokyo, JP); Ricoh Research Institute of General Electronics (Miyagi, JP)
Primary Examiner: Martin; Roland E.
Assistant Examiner:
Attorney, Agent or Firm: Flynn, Thiel, Boutell & Tanis

This invention relates to a photosensitive material for electrophotography having, on a substrate, an amorphous silicon layer comprising silicon atom as the matrix and containing at least one of hydrogen atom, halogen atom and heavy hydrogen atom, characterized by provided with a porous aluminum oxide layer between said substrate and said amorphous silicon layer. This invention further relates to a photosensitive material for electrophotography having, on a substrate, an amorphous silicon layer comprising silicon atom as the matrix and containing at least one of hydrogen atom, halogen atom and heavy hydrogen atom, characterized by provided with a porous aluminum oxide layer having the surface treated with a silicide material between said substrate and said amorphous silicon layer.

DETAILED DESCRIPTION An object of this invention is to provide a photosensitive material for electrophotography which can be produced by a relatively easy method and which has a high quality and high durability and is achieved by improving the adhesion between a substrate and an amorphous silicon layer.
That is, an object of this invention is to provide a photosensitive material for electrophotography, having on a substrate, an amorphous silicon layer comprising silicon atom as the matrix and containing at least one of hydrogen atoms, halogen atoms and heavy hydrogen atoms, characterized by a porous aluminum oxide layer positioned between said substrate and said amorphous silicon layer.
Another object of this invention is to provide a photosensitive material for electrophotography having, on a substrate, an amorphous silicon layer comprising silicon atoms as the matrix and containing at least one of hydrogen atoms, halogen atoms and heavy hydrogen atoms, characterized by being provided with a porous aluminum oxide layer having its surface treated with a silicide material between said substrate and said amorphous silicon layer.



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