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Details
Inventors: Petry, III, John P.; Picard, Len L.;
Assignee: Cognex Corporation (Natick, MA)
Primary Examiner: Stamber; Eric W.
Assistant Examiner:
Attorney, Agent or Firm: Weinzimmer, Esq.; Russ

A machine vision system for inspection of a mark (such as a multi-character mark) on an IC device as shown. The system provides search and defect analysis for the mark, individual characters of the mark, and the foreground and the background of the mark. The system provides for search and defect analysis reports thereof. It includes components for operator training search and defect analysis models for the whole mark, and for automatic training of such models for individual characters of the mark.

DETAILED DESCRIPTION The foregoing objects are attained by the invention which provides, in one aspect, an improved mark inspection apparatus.
The apparatus includes a video camera that generates a digital image of a mark, as well as "training" tools that generate search and defect analysis models from training (or sample) marks provided by an operator.
The apparatus further includes a search tool that determines various attributes of the run-time, or candidate, mark, e.
g.
, location, contrast and score.
It also includes a defect analysis tool that determines the deviation from a model of the candidate mark.
The improvement is characterized, in part, as a training element that invokes operation of search and defect analysis training to generate models of the mark and also of subcomponents, such as characters, of the mark.
The improvement further provides for an inspection element that invokes the search tool and the defect analysis tool to quantify the respective attributes of the mark and its subcomponents, and their deviation from training data.
An output element generates a report signal reflecting both the attributes (e.
g.
, location) and quality of the mark and the subcomponents.
In still another aspect of the invention, the character training and character inspection elements can include partitioning functionality for automatically initially identifying subcomponents of the mark (which the user can adjust).
In another aspect of the invention, the training means invokes operation of the defect analysis training means to generate defect analysis models of at least portions of the background or foreground of the mark and/or subcomponents of the mark, where the foreground is usually ink on a solid background, but could be the result of some other process such as laser etching, the inspection means invokes the defect analysis means for operation on the background or foreground of either mark and/or subcomponent, and means for generating reports thereof are included.
In the event the locations of the subcomponents identified during training differ from those identified during inspection, a system according to the invention can selectively mask the subcomponent locations to properly identify defects in the mark background or foreground



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