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Advanced illumination system for use in microlithography
| Details |
Inventors: Oskotsky, Mark; Ryzhikov, Lev; Coston, Scott; Tsacoyeanes, James; Baumgartner, Peter J.; Augustyn, Walter;
Assignee: ASML Holding N.V. (Veldhoven, NL)
Primary Examiner: Spector; David N.
Assistant Examiner:
Attorney, Agent or Firm: Sterne, Kessler, Goldstein & Fox, P.L.L.C.
The present invention relates to an illumination system including an illumination source, a beam conditioner placed in an optical path with the illumination source, a first diffractive array, a condenser system and a second diffractive array. The illumination source directs light through the beam conditioner onto the first diffractive array. The light is then directed to the condenser system placed in an optical path between the first diffractive array and second diffractive array. The condenser system includes a plurality of stationary optical elements and a plurality of movable optical elements. The plurality of movable optical elements are placed in an optical path with the plurality of stationary optical elements. The movable optical elements are capable of translation between the plurality of stationary optical element to zoom the light received from the first diffractive array. The second diffractive array is optically coupled to the condenser system, receives light from the condenser system, which in turn generates an illumination field at a reticle. |
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DETAILED DESCRIPTION The present invention generally relates to illumination systems in photolithography.
More specifically, the present invention relates to systems and methods for varying a size of an illumination field at a reticle in an optical system.
In one embodiment of the present invention, an illumination system, according to the present invention, includes an illumination source, a first diffractive array, a second diffractive array, and a condenser system placed in an optical path between the first diffractive array and the second diffractive array.
The first diffractive array, also referred to as a field space array, is a double diffractive array.
A light passing through the first diffractive array has a specific numerical aperture.
The numerical aperture determines the size and/or shape of the illumination field at the reticle.
In one embodiment, the first diffractive array is a diffractive grid capable of passing through light of different order of magnitude and refracting it out at various angles.
In another embodiment, the first diffractive array includes a plurality of microlenses capable of refracting light at various angles.
The second diffractive array, also referred to as a pupil array, is a double diffractive array similar in structure to the first diffractive array.
The second diffractive array is able to expand and/or reduce the size of the illumination field formed at the reticle by a light passing through the second diffractive array.
According to a further feature, the condenser system includes a plurality of cylindrical and/or cross-cylindrical lenses having powers in scanning and/or cross-scanning directions.
The condenser system includes a plurality of stationary lenses and a plurality of movable lenses.
The plurality of stationary lenses includes an input lens and an output lens.
The plurality of movable lenses includes a number of lenses capable of translation between the input and the output lenses.
By translating movable lenses between the input and the output lenses, the condenser system expands and/or reduces the magnitude of a light passing through the condenser system and, hence, the size of the illumination field formed by the light at the reticle
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Lighting 
