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Apparatus-for-processing-glass-substrate

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Apparatus for processing glass substrate

Details

Inventors: Hirano, Shinsuke; Takatsu, Kei; Kadomura, Shingo;
Assignee: Sony Corporation (Tokyo, JP)
Primary Examiner: Diamond; Alan
Assistant Examiner:
Attorney, Agent or Firm: Kananen; Ronald P. Rader, Fishman & Grauer

A glass substrate processing apparatus, part of which comprises a composite material, the composite material being formed of a matrix and a ceramic layer formed on a surface of the matrix by a thermal spraying method, the matrix being formed of a ceramic member and an aluminum-containing material filled in a texture of the ceramic member.

DETAILED DESCRIPTION It is an object of the present invention to provide a glass substrate processing apparatus which can avoid the occurrence of damage caused by a thermal expansion coefficient difference between materials constituting the glass substrate processing apparatus, which is feasible for use at high temperatures, which permits the processing of a glass substrate having a large area and which permits the processing, for example, of a base material formed on a glass substrate at high temperatures.
The glass substrate processing apparatus of the present invention for achieving the above object is a glass substrate processing apparatus, part of which comprises a composite material, the composite material being formed of a matrix and a ceramic layer, the matrix being formed of a ceramic member and an aluminum-containing material filled in a texture of the ceramic member, and the ceramic layer being formed on a surface of the matrix by a thermal spraying method.
"Processing a glass substrate" as used in the present specification refers not only to a case where a glass substrate itself is processed but also to a case where a base material formed on a glass substrate is processed.
Further, "processing" includes etching treatment, CVD treatment and sputtering.
The glass substrate processing apparatus of the present invention may be an embodiment which is for carrying out etching treatment, CVD treatment or sputtering on a base material formed on a glass substrate and in which the part of the glass substrate processing apparatus comprising the composite material constitutes a glass substrate supporting stage having an electrostatic chuck function and having temperature controlling means.
The invention includes an embodiment in which the glass substrate supporting stage is used as an electrode and the ceramic layer has an electrostatic chuck function (single-polar system) or an embodiment in which an electrode is formed within the ceramic layer and the ceramic layer has an electrostatic chuck function (bipolar system)

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