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Wafer holding device in an exposure apparatus
It is accordingly an object of the present invention to provide an exposure wafer holding device, by which the wafer can be cooled without degradation of the pattern ...
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Method and apparatus for storing and dispensing a liquid composed of oxygen containing mixture
In accordance with the present invention, a method is provided for storing and dispensing a liquid consisting of an oxygen containing mixture to ensure that the liquid ...
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Method and a device for precooling the helium tank of a cryostat
Now, it is the object of the present invention to provide a method and/or a device for precooling the helium tank of a cryostat which avoid the before-mentioned ...
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Cooling system for superconducting magnet
What is claimed is: 1. A cooling system for circulating a refrigerant flowing through a heat exchanger which is connected to a cryocooler coldhead, the cooling system ...
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Semiconductor processing apparatus for promoting heat transfer between isolated volumes
In accordance with the present invention, an apparatus and method are disclosed which can be used to provide a seal between two portions of a semiconductor processing ...
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Ion purification for plasma ion implantation
In accordance with the present invention, ions in a plasma which are to be implanted in a target by the plasma source ion implantation process are purified to eliminate ...
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System and method for producing oscillating magnetic fields in working gaps useful for irradiating a surface with atomic and molecular ions
What is claimed is: 1. A magnetic scanning system for rapidly sweeping a high perveance beam of atomic or molecular ions over a selected surface, said beam initially ...
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Low temperature reaction bonding
In the method for enhancing the bond energy of solid-to-solid reaction bonding, the surfaces to be bonded are polished to a roughness in the order of atomic dimensions ...
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Direct gas-phase doping of semiconductor wafers using an organic dopant source of phosphorus
The present invention encompasses using an organic source of a dopant species, including the organic compounds comprising boron, arsenic and phosphorous for thermally ...
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Apparatus for obtaining dose uniformity in plasma doping (PLAD) ion implantation processes
A PLAsma Doping (PLAD) ion implantation apparatus is described for obtaining dose uniformity radially across the surface of an ion implantation target wherein the target ...
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