 Wide angle binocular system with variable power capability |
| The present invention takes a completely different approach from the prior art. Specifically, ... |
|
| Light-source device and projection-type display device |
| Thus it is an object of the present invention to provide a light-source device capable of ... |
|
| Centrifugal illumination system |
| An object of the present invention is, therefore, to provide an illumination system. Another object ... |
|
| Apparatus for uniformly illuminating a light valve |
| The present invention meets the need for a simple, low cost light uniformizing or homogenizing ... |
|
| Projection displays with divergent chief rays at beam splitter |
| Projection displays according to the invention preferably comprise a color-separation optical ... |
|
| Lighting system and projection type display unit using thereof |
| The present invention has been achieved to solve the above-mentioned problems, and it is an object ... |
|
| Outer suspension type lens shielding mask for projection apparatus |
| The main object of the present invention is to provide an outer suspension type lens shielding mask ... |
|
| Electronic gun and target apparatus and method |
| It is therefore an object of the invention to provide a novel and useful fire and hit indicator ... |
|
| Firearm with separable radiation emitting attachment |
| I claim: 1. A firearm comprising a housing; an ammunition-receiving firing chamber detachably ... |
|
| Illuminated gun sight and low ammunition warning assembly for firearms |
| The present invention is directed to an assembly for use on a firearm and, specifically an ... |
|
|
Projection exposure apparatus
| Details |
Inventors: Suwa, Kyoichi; Ushida, Kazuo; Suto, Takeshi; Kameyama, Masaomi; Hirukawa, Shigeru; Nakamura, Shinichi;
Assignee: Nikon Corporation (Tokyo, JP)
Primary Examiner: Hayes; Monroe H.
Assistant Examiner:
Attorney, Agent or Firm: Shapiro and Shapiro
A projection exposure apparatus is provided with an illuminating optical system for illuminating a reticle having a predetermined fine pattern, a projection optical system for projecting the pattern of the reticle onto a wafer, and diaphragm means so constructed as to vary the aperture of a diaphragm of the projection optical system, wherein means for receiving information on the pattern present on the reticle, and means for determining a diaphgram aperture capable of eliminating the high-order diffracted light generated by the pattern of the reticle according to information as stated above and controlling the aperture of variable diaphragm means of the projection optical system, are provided. |
|
DETAILED DESCRIPTION In consideration of the foregoing, the object of the present invention is to provide a projection exposure apparatus capable of eliminating the drawbacks of the conventional apparatus and easily determining the adequate N.
A.
of the projection optical system for a predetermined pattern, thereby easily realizing the optimum projection exposure condition and promptly and exactly achieving the transfer of the pattern ever becoming finer in dimension.
The exposure apparatus of the present invention is provided with an illuminating optical system for illuminating a reticle having a predetermined fine pattern; a projection optical system for projecting the pattern of said reticle onto a wafer; and diaphragm means so constructed as to vary the aperture of a diaphragm of said projection optical system, wherein the diaphragm aperture of said projection optical system is so varied as to eliminate, among the diffracted light generated by the fine pattern present on the reticle, a portion of larger diffraction angles, namely high-order diffracted light not necessary for the formation of image of said pattern.
More specifically the apparatus of the present invention is featured by the presence of means for receiving information on the pattern present on the reticle, and means for determining a diaphragm aperture capable of eliminating the high-order diffracted light generated by said pattern of the reticle according to said information and controlling the aperture of variable diaphragm means of said projection optical system.
In such structure, an adequate example of such information on the pattern is the information on the minimum line width of the pattern, and the diaphragm control means is preferably constructed in such a manner as to determine, based on the information on the minimum line width of the pattern, the diaphragm aperture corresponding to the diffraction angle of the second-or higher-order diffracted light of the illuminating light supplied from the illuminating optical system, and to control the diaphragm means at an aperture smaller than said determined diaphragm aperture
|
|
Lighting 
