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| Outer suspension type lens shielding mask for projection apparatus |
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| Electronic gun and target apparatus and method |
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| Firearm with separable radiation emitting attachment |
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| Illuminated gun sight and low ammunition warning assembly for firearms |
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| Simulated weapon with gas cartridge |
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| Shooting video game machine and shooting result presentation method |
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| Trigger apparatus of a gun that projects light |
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| Home exterior selection kit |
| OF THE PREFERRED EMBODIMENTS Certain terminology is used in the following description for ... |
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Zoom illumination system for use in photolithography
| Details |
Inventors: Hoffman, Jeffrey M.; Kunick, Joseph M.; Oskotsky, Mark; Ryzhikov, Lev;
Assignee: Silicon Valley Group, Inc. (Ridgefield, CT)
Primary Examiner: Sugarman; Scott J.
Assistant Examiner:
Attorney, Agent or Firm: Sterne, Kessler, Goldstein & Fox P.L.L.C.
The present invention provides an illumination system for varying the size of an illumination field incident to a scattering optical element. The illumination field is subsequently imaged to a reticle in a photolithographic process. The illumination system includes, in series along an optical axis of the illumination system, an optical source, a beam conditioner, a first optical integrator, a first or input collimating lens, a zoom array integrator (ZAI), a second or output collimating lens, the optical scattering element, a relay lens, and the reticle. The ZAI includes an assembly of fixed and moveable lens components arranged to vary the size of the illumination field throughout a zoom range of the ZAI while maintaining telecentric illumination at a substantially fixed numerical aperture. Illumination telecentricity and substantially fixed numerical apertures are maintained at both the scattering optical element and the reticle throughout the zoom range. |
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DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS I.
Example Illumination System FIG.
1A is an illustration of an example illumination system 100 at a first zoom position, according to the present invention.
Illumination system 100 includes, in series and centered along an optical axis 102 parallel with a Z-axis, an illumination source 104, a beam conditioner 106, an optical integrator 107, a unique condenser 112 according to the present invention, a scattering optical element 114, and a relay lens assembly 116.
Illumination system 100 illuminates a reticle 118.
Illumination source 104 directs electromagnetic radiation (EM) into beam conditioner 106.
The illumination source is used in its broadest sense to mean any EM radiation source regardless of wavelength.
Therefor, the illumination source 104 may be a laser having a wavelength, such as an ultraviolet wavelength, that is not in the visible region.
An example application of the present invention uses wavelengths which include, but are not limited to, 248 nanometers (nm), 193 nm, and 157 nm.
Additionally, the illumination source 104 may be a pulsed laser or a continuous wave laser.
The beam conditioner 106 enlarges or modifies the beam of electromagnetic radiation from the illumination source 104.
Beam conditioner 106 produces a collimated beam with a preferably rectangular cross-section.
This can be accomplished by a beam expander such as a refractive optical system, or a reflective optical system.
An exemplary beam conditioner is described in U.
S.
Pat.
No.
5,631,721, Hybrid Illumination System for Use in Photolithography, by S.
Stanton, et al.
, incorporated herein by reference in its entirety.
Beam conditioner 106 directs conditioned EM radiation through optical integrator or multi-image optical element 107.
Optical integrator 107 produces a plurality of incident point source images, preferably a rectangular grid or array of such images, at a focal plane 108.
Optical integrator 107 can be a two-dimensional array of spherical lenses, or two orthogonal one-dimensional arrays of cylindrical lenses
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Lighting 
