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| Method for manufacturing block copolymer |
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Apparatus for treating organic waste gas
| Details |
Inventors: Yanagi, Motonori; Hama, Masaharu; Fukumoto, Takaaki; Tsukaguchi, Miki;
Assignee: Mitsubishi Denki Kabushiki Kaisha (Tokyo, JP)
Primary Examiner: Jones; W. Gary
Assistant Examiner: Nguyen; Dean
Attorney, Agent or Firm: Leydig, Voit & Mayer
An apparatus for treating an organic waste gas has an oxidizing means for contacting the waste gas with an oxidizing agent to effect primary oxidation and form a primary oxidation product. An ultraviolet wave generator inadiates the primary reaction product with UV light in the near UV range to effect secondary oxidation of the primary reaction product. |
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DETAILED DESCRIPTION Accordingly, an object of the present invention is to provide a method and apparatus for treating organic waste gas which do not require discharge of organic solvent to the outside of the system during operation and maintenance of the system, and which do not require the renewal and regeneration of the organic solvent adsorption means and, hence, do not require suspension of operation of the system, so as to ensure a high efficiency of operation of the apparatus, thereby overcoming the above-described problems of the prior art.
To this end, according to one aspect of the present invention, there is provided a method of treating an organic waste gas containing an organic phase such as an organic solvent, comprising: a first step of primarily oxidizing the waste gas by means of a first oxidizing means; and a second step of secondarily almost completely oxidatively decomposing, by means of a second oxidizing means, the organic waste gas primarily oxidized by the first oxidizing means.
According to another aspect of the present invention, there is provided a method of treating an organic waste gas containing an organic phase such as an organic solvent by bringing the organic waste gas into gas-liquid contact with an oxidizing solvent so as to change the organic waste gas into an inorganic solution which is to be discharged to the outside of the system, comprising: a first step of bringing the organic waste gas into gas-liquid contact with the oxidizing solvent thereby to cause the organic waste gas to be dissolved in the oxidizing solvent; and a second step of allowing the mixture of the oxidizing solvent and the organic waste gas dissolved therein to stay in a reservoir and irradiating the mixture in the reservoir with ultraviolet rays thereby promoting the oxidative decomposition of the organic waste gas by the oxidizing solvent.
According to still another aspect of the present invention, there is provided an apparatus for treating an organic waste gas containing an organic phase such as an organic solvent, comprising: a first oxidizing means for primarily oxidizing the organic waste gas; and a second oxidizing means for promoting the oxidation of the organic waste gas oxidized by the first oxidizing means, thereby secondarily and almost completely oxidatively decomposing the organic waste gas
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Liquid Purification 
