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Details
Inventors: Barshter, Dennis Wayne; Del Vecchio, Michael Arthur;
Assignee: Envirogen, Inc. (Lawrenceville, NJ)
Primary Examiner: Beisner; William H.
Assistant Examiner:
Attorney, Agent or Firm: Ratner & Prestia

An apparatus and method is provided for removing contaminants from a gas, wherein the gas flows through a gas treatment chamber having a biological treatment zone and a chemical treatment zone. The amount of a chemical treatment agent that is introduced into the chemical treatment zone is adjusted in response to a sensed condition or conditions.

DETAILED DESCRIPTION This invention relates to an apparatus and method for removing contaminants from a gas.
The gas is forced into contact with a biological treatment agent positioned within a gas treatment chamber as well as a chemical treatment agent that is introduced into the chamber.
The amount of chemical treatment agent that is introduced is adjusted in response to a sensed condition.
A chemical treatment zone is positioned in the chamber.
The chemical treatment agent is introduced from a source into the chemical treatment zone.
A biological treatment zone is positioned in the chamber adjacent to the chemical treatment zone.
A sensor detects one or more conditions indicative of the ability of the biological treatment zone to treat gas contaminants.
A controller connected to the sensor adjusts the amount of chemical treatment agent that is introduced into the chemical treatment zone in response to the sensed condition or conditions.
In operation, contact is caused between the chemical treatment agent and the contaminated gas, thereby inducing a chemical reaction.
Also, contact is caused between a microbe population in the biological treatment zone and the gas, thereby inducing a biological reaction.
Chemical treatment is adjusted in response to the sensed condition or conditions to at least partially compensate for any anticipated decrease in the performance of the biological treatment.



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