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Home Liquid Purification Chemical-resistant-wholly-aromatic-polyamide-fiber-material

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 Chemical-resistant wholly aromatic polyamide fiber material

Details
Inventors: Sasaki, Hideharu; Tamura, Yorikazu; Shimada, Keizo;
Assignee: Teijin Limited (Osaka, JP)
Primary Examiner: Kendell; Lorraine T.
Assistant Examiner:
Attorney, Agent or Firm: Burgess, Ryan and Wayne

A wholly aromatic polyamide fiber material having an excellent resistance to chemicals, comprises wholly aromatic polyamide fibers each covered with a coating of a fluorine-containing polymeric resin which coating has been derived from an aqueous emulsion of the fluorine-containing polymer resin.

DETAILED DESCRIPTION OF THE INVENTION In the chemical-resistant wholly aromatic polyamide fiber material of the present invention, each of the wholly aromatic polyamide fibers is covered with a coating of a fluorine-containing polymeric resin which has been formed from an aqueous emulsion of the resin.
The wholly aromatic polyamide fibers are preferably made from at least one aromatic polyamide containing at least 75 molar % of repeating units selected from the group consisting of those of the formulae (I) and (II): ##STR1## wherein Ar.
sub.
1, Ar.
sub.
2 and Ar.
sub.
3 respectively present, independently from each other, an unsubstituted or substituted divalent aromatic radical which comprises a single aromatic ring, or two or more aromatic rings that are condensed together, or are linked together by a single bond, or by a bridging atom or radical, and which is oriented either meta or para, and R.
sub.
1, R.
sub.
2 and R.
sub.
3 respectively represent, independently from each other, a hydrogen atom or an alkyl radical having 1 to 3 carbon atoms.
In the formulae (I) and (II), it is preferable that Ar.
sub.
1, Ar.
sub.
2 and Ar.
sub.
3 be respectively selected, independently from each other, from the group consisting of the radicals of the formulae: ##STR2## wherein R represents a member selected from the group consisting of lower alkyl radicals having 1 to 6 carbon atoms, lower alkoxy radicals having 1 to 6 carbon atoms, halogen atoms and a nitro radical, n represents zero or an integer of from 1 to 4 and X' represents a member selected from the group consisting of ##STR3## wherein Y' represents a member selected from the group consisting of a hydrogen atom and lower alkyl radicals having 1 to 6 carbon atoms.
Also, in the formulae (I) and (II), it is more preferable that Ar.
sub.
1, Ar.
sub.
2 and Ar.
sub.
3 respectively represent, independently from each other, a member selected from p-phenylene radical, m-phenylene radical, biphenylene radical and radicals of the formulae: ##STR4## wherein X.
sup.
2 represents a member selected from ##STR5## in which Y



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