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Method for fabricating a radiation-emitting semiconductor chip based on III-V nitride semiconductor
It is accordingly an object of the invention to provide a method for fabricating a radiation-emitting semiconductor chip based on III V nitride semiconductor that ...
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Solid state CMOS imager using silicon-on-insulator or bulk silicon
Having thus described our invention, what we claim as new and desire to secure by Letters Patent is: 1. An apparatus for detecting an image comprising: an array of ...
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Image sensor and method for fabricating the same
OF THE INVENTION FIG. 3 is a plane view showing a complementary metal-oxide semiconductor device (hereinafter referred as to CMOS) image sensor in accordance with a ...
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Semiconductor device with upper portion of plugs contacting source and drain regions being a first self-aligned silicide
Accordingly, it is an object of the present invention to solve the aforementioned problem of the conventional techniques, and to provide a semiconductor device capable ...
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Aligning method of liquid crystal, process for producing liquid crystal device, and liquid crystal device produced by the process
In view of the above-mentioned circumstances, an object of the present invention is to provide an aligning method of a(chiral)smectic liquid crystal capable of ...
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Transistor and semiconductor device
What is claimed is: 1. A transistor comprising: a transparent channel layer using any one of zinc oxide ZnO, zinc magnesium oxide Mg.sub.x Zn.sub.1-x O, zinc cadmium ...
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Semiconductor circuit and method of fabricating the same
In view of the above-mentioned problems, an object of the present invention is to provide a forming method for a channel forming region from a crystalline semiconductor ...
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In-line wafer surface mapping
FIG. 2 is a plan view that illustrates an uneven substrate surface of an exemplary substrate. Alternatively stated, the substrate surface has a non-uniform topography. T...
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Light reflecting micromachined cantilever
The present invention is directed to overcoming one or more of the problems set forth above. Briefly summarized, according to one aspect of the present invention there ...
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Micro-electro mechanical device made from mono-crystalline silicon and method of manufacture therefore
It is therefore one object of the present invention to provide an improved micro-electro-mechanical device and method of manufacture therefore with a monolithic unitary ...
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