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Chemical vapor deposition of group IIA metals and precursors therefor
| Details |
Inventors: Erbil, Ahmet;
Assignee: Georgia Tech Research Corporation (Atlanta, GA)
Primary Examiner: Silverman; Stan
Assistant Examiner:
Attorney, Agent or Firm: Oldham & Oldham Co.
Coatings of Group IIA metals and compounds thereof are formed by chemical vapor deposition, in which a heat decomposable organometallic compound of the formula (I) ##STR1## where M is a Group IIA metal, preferably magnesium, calcium, strontium, or barium and R is a lower alkyl or alkenyl radical containing from 2 to about 6 carbon atoms, with a heated substrate which is above the decomposition temperature of the organometallic compound. The pure metal is obtained when the compound of the formula I is the sole heat decomposable compound present and deposition is carried out under nonoxidizing conditions. Intermetallic compounds such as barium selenide can be deposited from a barium compound of formula I and a heat decomposable selenium compound under nonoxidizing conditions. Group II metal oxides and salts, such as barium titanate, are obtainable by deposition from a compound of formula I (and an additional titanium organometallic compound (under oxidizing conditions. |
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DETAILED DESCRIPTION What is claimed is: 1.
A process chemical vapor deposition for depositing a metallic coating on a heated substrate by thermal decomposition of an organometallic compound, said process comprising contacting an organmetallic compound of the formula ##STR3## where M is magnesium, calcium, strontium or barium or a mixture thereof and R is an alkyl or alkenyl radical containing from 2 to about 6 carbon atoms, with said heated substrate, said substrate being at a temperature above the decomposition temperature of said organometallic compound.
2.
A process according to claim 1 in which M is calcium, strontium or barium.
3.
A process according to claim 1 in which R contains from 2 to about 4 carbon atoms.
4.
A process according to claim 1 in which R is an alkyl radical.
5.
A process according to claim 1 in which R is isopropyl.
6.
A process according to claim 1 in which said organometallic compound is supplied in a stream of carrier gas.
7.
A process according to claim 6 in which said carrier gas is a non-oxidizing carrier gas and said substrate is in a non-oxidizing atmosphere.
8.
A process according to claim 1 in which the temperature of said substrate is from about 150.
degree.
to about 1000.
degree.
C.
9.
A process according to claim 1 in which said coating has a thickness not greater than about 100 microns.
10.
A process according to claim 1 in which said metallic coating comprises a metal compound, said process further comprising contacting an oxidizing agent with said substrate.
11.
A process according to claim 1 in which said metallic coating comprises at least two metals or metal compounds, said process further comprising contacting a second organometallic compound, which on decomposition yields a second metal, with said substrate.
12.
A process according to claim 1 in which said coating comprises an intermetallic compound.
13.
A process according to claim 12 in which said intermetallic compound is barium selenide.
14.
A process according to claim 11 further comprising contacting an oxidizing agent with said substrate
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MEMS 
