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Cold-cathode ion source with a controlled position of ion beam
| Details |
Inventors: Maishev, Yuri; Ritter, James; Velikov, Leonid; Shkolnik, Alexander;
Assignee: Advanced Ion Technology, Inc. (Fremont, CA)
Primary Examiner: Bettendorf; Justin P.
Assistant Examiner:
Attorney, Agent or Firm:
A cold-cathode ion source with a closed-loop ion-emitting slit which is provided with means for generating a cyclically-variable, e.g., alternating or pulsating electric or magnetic field in an anode-cathode space. These means may be made in the form of an alternating-voltage generator which generates alternating voltage on one of the cathode parts that form the ion-emitting slit, whereas the other slit-forming part is grounded. The alternating voltage deviates the ion beam in the slit with the same frequency of the alternating voltage. In accordance with another embodiment, the aforementioned means may be an electromagnetic coil which generates a magnetic field which passes through the ion-emitting slit, thus acting on the condition of the spatial-charge formation and, hence, on concentration of ions in the ion beam. The cold-cathode ion source may be of any type, i.e., with the ion beam emitted in the direction perpendicular to the direction of drift of electrons in the ion-emitting slit or with the direction of emission of the beam which coincides with the direction of electron drift. |
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DETAILED DESCRIPTION We claim: 1. A method for controlling position of an ion beam on the surface of an object to be treated with said ion beam, comprising: providing a cold-cathode ion source with crossed electrical and magnetic fields and with at least one ion-emitting slit, said ion source having a voltage source, an anode connected to a positive potential of said voltage source; and a cathode which comprises at least two parts which are electrically isolated from each other and form said ion-emitting slit; at least one of said two parts being connected to said voltage source; activating said ion source and generating an ion beam which is emitted through said at least one ion-emitting slit toward said object, said ion beam being charged positively with respect to said at least one part of said cathode which is connected to said voltage source; applying a potential to said at least one part of said cathode from said voltage source for generating an electric field across said at least one ion-emitting slit; acting by said electric field onto said ion beam; and deviating said ion beam in a direction transverse to said direction of said ion beam. 2. The method of claim 1, wherein said voltage source is an alternating voltage source having a voltage pulse with a positive half-wave and a negative halve wave, said electric field being generated only during said positive half-wave of said voltage pulse. 3. A method of claim 1, wherein said voltage source comprises: a main voltage source having a main positive terminal and a main negative terminal, said main positive terminal of said first voltage source being connected to said anode; an additional voltage source having an additional positive terminal and an additional negative terminal; said at least two parts of said cathode being electrically isolated from one another, at least one of said two parts being connected to said additional power source; said ion beam being charged positively by said main voltage source with respect to said at least one part of said cathode which is connected to said additional voltage source; said additional voltage source generating an additional electric field across said at least one ion-emitting slit; said step of acting onto said ion beam being performed by said additional electric field
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