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Method for deposition of diamond-like carbon and silicon-doped diamond-like carbon coatings from a hall-current ion source
| Details |
Inventors: Mahoney, Leonard Joseph; Brown, David Ward; Petrmichl, Rudolph Hugo;
Assignee: Diamonex, Incorporated (Allentown, PA)
Primary Examiner: King; Roy V.
Assistant Examiner:
Attorney, Agent or Firm: Coudert Brothers
A unique Hall-Current ion source apparatus is used for direct ion beam deposition of DLC coatings with hardness values greater than 10 GPa and at deposition rates greater than 10 .ANG. per second. This ion source has a unique fluid-cooled anode with a shadowed gap through which ion sources feed gases are introduced while depositing gases are injected into the plasma beam. The shadowed gap provides a well maintained, electrically active area at the anode surface which stays relatively free of non-conductive deposits. The anode discharge region is insulatively sealed to prevent discharges from migrating into the interior of the ion source. A method is described in which a substrate is disposed within a vacuum chamber, coated with a coating of DLC or Si-DLC at a high deposition rate using a Hall-Current ion source operating on carbon-containing or carbon-containing and silicon-containing precursor gases, respectively. The method is particularly advantageous for producing thin, hard, wear resistant DLC and Si-DLC coatings for magnetic transducers and media used for magnetic data storage applications. |
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DETAILED DESCRIPTION OF THE INVENTION A detailed description of the Hall-Current ion source of the present invention, its operation, and embodiments are set forth in U.
S.
Pat.
No.
5,973,447, the detailed description of which is incorporated herein by reference.
FIG.
1 illustrates one particular axisymmetric embodiment of the Hall-Current ion source.
The apparatus 10 is comprised of the basic components of the closed path Hall-Current ion source apparatus.
Hall-Current ion source 10 comprises cathode assembly 12, keeper assembly 13, magnetic field circuit assembly and electromagnet 14, anode assembly 16, and separate power supply means (not shown) for supplying a voltage to drive cathode electron emitter source 18 and power supply means (not shown) to drive anode 16 and electromagnet 14.
The magnetic field circuit which is comprised of a water-cooled magnetic core assembly 20, back plate 22, outer shell 24, outer pole plate 26 and inner pole piece 28 is driven by electromagnet 14 positioned within the center of cylindrical ion source housing assembly 10.
The power supply means supplies DC, AC, RF, pulsed voltage wave forms or combinations of such voltage wave forms, although, DC and pulsed-DC are conventionally used.
The nonmagnetic stainless steel anode assembly 16 comprises inner anode ring 30 and outer anode ring 32, gap 34 defined by the alignment of rings 30 and 32, gas distribution manifold or injection ring 40 supplied by an electrically isolated gas feed line 42.
Several gas injection holes are sized and spaced so as to uniformly distribute gas from manifold 40 into gap 34.
Anode 16 also includes two water cooling channels.
Anode assembly 16 is held together by two circular arrays of fasteners, e.
g.
, shoulder screws 44 and is isolated from the magnetic circuit assembly by inner insulator rings 48 and outer insulators 50, which are typically made of high temperature ceramic.
Anode assembly 16 is attached to the underside of flange assembly 60 by several fasteners 62 and insulators 64
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