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Method of fabricating a surface shape recognition sensor
| Details |
Inventors: Machida, Katsuyuki; Shigematsu, Satoshi; Morimura, Hiroki; Hirata, Akihiko;
Assignee: Nippon Telegraph and Telephone Corporation (Tokyo, JP)
Primary Examiner: Quach; T. N.
Assistant Examiner:
Attorney, Agent or Firm: Blakely Sokoloff Taylor & Zafman
A surface shape recognition sensor of this invention includes at least a plurality of capacitance detection elements having sensor electrodes arranged in the same plane on an interlevel dielectric film formed on a semiconductor substrate to be insulated/isolated from each other, capacitance detection means for detecting the capacitances of the capacitance detection elements, and a stationary electrode disposed on the interlevel dielectric film to be insulated/isolated from the sensor electrodes. When an object to be recognized touches the upper surface of the stationary electrode, the capacitances detected by the capacitance detection elements change in accordance with the recesses/projections on the upper surface. |
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DETAILED DESCRIPTION The present invention has been made to solve the above problem, and has as its object to reliably perform stable, high-sensitivity surface shape detection without causing damage due to static electricity generated in sensing operation.
In order to achieve the above object, according to an aspect of the present invention, there is provided a surface shape recognition sensor comprising a plurality of capacitance detection elements having sensor electrodes stationarily arranged in one plane on an interlevel dielectric film formed on a semiconductor substrate to be insulated/isolated from each other, capacitance detection means for detecting capacitances of the respective capacitance detection elements, and a stationary electrode formed on the interlevel dielectric film to be insulated/isolated from the sensor electrodes.
With this arrangement, when an object to be recognized touches the sensor, the capacitances detected by the capacitance detection elements change in accordance with the recesses/projections on the surface of the object.
According to another aspect of the present invention, in the above arrangement, the sensor further comprises a counter electrode supported on the stationary electrode, disposed opposite the sensor electrodes to be disposed above the sensor electrodes at a predetermined distance therefrom, and having portions, located above the sensor electrodes, which can deform toward the sensor electrodes, and the capacitance detection means detect capacitances between the sensor electrodes and the counter electrode.
When, therefore, an object to be recognized touches the sensor, the counter electrode deforms in conformity to the recesses/projections on the surface of the object, and the capacitances between the sensor electrodes and the counter electrode change in accordance with the recesses/projections on the surface of the object.
In this arrangement, the sensor may further comprise a film disposed on the counter electrode and having insulating properties, and the film may have projections at positions above the respective sensor electrodes
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MEMS 
