Solid state CMOS imager using silicon-on-insulator or bulk silicon |
| Having thus described our invention, what we claim as new and desire to secure by Letters Patent is:... |
|
Image sensor and method for fabricating the same |
| OF THE INVENTION FIG. 3 is a plane view showing a complementary metal-oxide semiconductor device (... |
|
Transistor and semiconductor device |
| What is claimed is: 1. A transistor comprising: a transparent channel layer using any one of zinc ... |
|
Semiconductor circuit and method of fabricating the same |
| In view of the above-mentioned problems, an object of the present invention is to provide a forming ... |
|
In-line wafer surface mapping |
| FIG. 2 is a plan view that illustrates an uneven substrate surface of an exemplary substrate. A... |
|
Light reflecting micromachined cantilever |
| The present invention is directed to overcoming one or more of the problems set forth above. B... |
|
Micro-electro mechanical device made from mono-crystalline silicon and method of manufacture therefore |
| It is therefore one object of the present invention to provide an improved micro-electro-mechanical ... |
|
|
Method of manufacturing a semiconductor light emitting device, semiconductor light emitting device, method of manufacturing a semiconductor device, semiconductor device, method of manufacturing a device, and device
| Details |
Inventors: Asatsuma, Tsunenori; Tomiya, Shigetaka; Tamamura, Koshi; Tojo, Tsuyoshi; Goto, Osamu; Motoki, Kensaku;
Assignee: Sony Corporation (Tokyo, JP) Sumitomo Electric Industries, Ltd. (Osaka, JP)
Primary Examiner: Crane; Sara
Assistant Examiner:
Attorney, Agent or Firm: Sonnenschein Nath & Rosenthal LLP
When a semiconductor light emitting device or a semiconductor device is manufactured by growing nitride III V compound semiconductor layers, which will form a light emitting device structure or a device structure, on a nitride III V compound semiconductor substrate composed of a first region in form of a crystal having a first average dislocation density and a plurality of second regions having a second average dislocation density higher than the first average dislocation density and periodically aligned in the first region, device regions are defined on the nitride III V compound semiconductor substrate such that the device regions do not substantially include second regions, emission regions or active regions of devices finally obtained do not include second regions. |
|
DETAILED DESCRIPTION OF THE PRESENTLY PREFERRED EMBODIMENTS Explained below are embodiments of the invention with reference to the drawings. In all figures illustrating the embodiments, identical or equivalent components are labeled with common reference numerals. The embodiment explained below is directed to a case using a substrate including a region A of a certain crystal and regions B having a crystallographic property different from the region A and periodically aligned in form of islands in the region A as shown in FIG. 1A, and forming semiconductor devices on the substrate. The regions B penetrate the substrate. The regions are inferior to the region in terms of crystalline quality, and contain more crystal defects. FIG. 1B shows a cross-sectional view taken along a line where the regions B appear closest to each other. Although each region B generally has an arbitrary polygonal prismatic shape, FIG. 1 shows them in form of circular cylinders for simplicity (also in the description hereunder). When a semiconductor laser is manufactured, semiconductor layers composing a device structure are sequentially grown on the substrate by metal-organic chemical vapor deposition (MOCVD), hydride vapor phase epitaxial growth, halide vapor phase epitaxial growth (HVPE), or the like. Then, through further necessary steps of forming electrodes, etc. and thereafter dividing the substrate and the semiconductor layers thereon into chips by dicing them by cleavage, for example, intended semiconductor devices are obtained. In the manufacturing process, crystal defects of the base substrate propagate to the semiconductor layers grown thereon. Therefore, the semiconductor layers accumulating on device regions containing regions B will be affected by influences of the defects, and will be inferior in property. For example, in case of a light emitting diode or a semiconductor laser, if those defects exist in its emission region, then its emission property and reliability will be damaged. Thus, to prevent the emission region, more broadly the active region, from adverse affection of the regions B, the following techniques are used
|
| Related patents |
|
|
Image sensor or LCD including switching pin diodes
OF CERTAIN EMBODIMENTS OF THIS INVENTION Referring now more particularly to the accompanying drawings in which like reference numerals indicate like parts throughout ...
|
|
|
Photoconductor-on-active-pixel (POAP) sensor utilizing equal-potential pixel electrodes
The active pixel sensor of the invention includes, in one embodiment, a solid state radiation detection unit comprising a crystalline semiconductor substrate, a ...
|
|
|
Off substrate flip-chip apparatus
OF THE INVENTION The latching off-chip arrangement of the present invention enables the prerelease of for example MEMS modules into a state that is accessible and ...
|
|
|
Correlating optical motion detector
In accordance with the present invention, an optical motion detector is comprised of a single chip having an array of photodiodes and means for focusing an image onto ...
|
|
|
CCD output signal processing circuit for use in an image pick-up device
It is an object of the present invention to provide a CCD output signal generating circuit for generating a CCD output signal in which various kinds of noise components ...
|
|
|
Semiconductor device having a charge transfer device, MOSFETs, and bipolar transistors--all formed in a single semiconductor substrate
Accordingly it is the object of this invention to provide semiconductor device which comprises a charge transfer device, bipolar transistors, and and MOSFETs, all formed ...
|
|
|
Semiconductor integrated circuit and method of making the same
It is an object of the present invention to provide a semiconductor integrated circuit device in which CCD type, bipolar type, and MOS type integrated circuits are ...
|
|
|
Solid state imaging device
An object of the present invention is to provide a solid state imaging device having a conventional microlens capable of realizing a high sensitivity. In order to ...
|
|
|
Method of visualizing minute particles
What is claimed is: 1. A method of determining the geometric dimension of a minute particle disposed on the top surface of a substrate, comprising: generating a ...
|
|
|
Charge coupled device/charge super sweep image system and method for making
I claim: 1. A method for processing an image for a charge coupled device (CCD) image system comprising: sensing said image on an array of photosites, each of said ...
|
|
|