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MEMS

Micro-electro-mechanical-system-MEMS-mirror-device-and-methods-for-fabricating-the-same

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Micro-electro-mechanical-system (MEMS) mirror device and methods for fabricating the same

Details

Inventors: Bowers, John Edward; Helkey, Roger Jonathan; Corbalis, Charles; Sink, Robert Kehl; Lee, Seung Bok; MacDonald, Noel;
Assignee: Calient Networks, Inc. (San Jose, CA)
Primary Examiner: Le; Que T.
Assistant Examiner:
Attorney, Agent or Firm: Blakely, Sokoloff, Taylor & Zafman LLP

A micro-electro-mechanical-system (MEMS) mirror device and methods for fabricating the same allow for a large range of angular motion for a center mirror component. The large range of angular motion for a center mirror component is dictated simply by a thickness of a substrate used or a thickness of a thick film used in making a support structure to support the center mirror component. The MEMS mirror device and methods for fabricating the same allow a large number mirror devices to be fabricated on a substrate. The MEMS mirror device includes a substrate. Electrodes are formed supported by the substrate. A support structure is formed adjacent to the electrodes. A hinge pattern and a mirror pattern having a center mirror component are formed such that the support structure supports the hinge pattern and mirror pattern. The support structure also supports the hinge pattern and mirror pattern such that a bottom surface of the center mirror component in a stationary non-rotating position is capable of exceeding a height of 50 .mu.m above the electrodes.

DETAILED DESCRIPTION A micro-electro-mechanical-system (MEMS) mirror device is disclosed.
The MEMS mirror device includes a substrate.
Electrodes are formed supported by the substrate.
A support structure is formed adjacent to the electrodes.
A hinge pattern and a mirror pattern having a center mirror component are formed such that support structure supports the hinge pattern and mirror pattern.
The support structure also supports the hinge pattern and mirror pattern such that a bottom surface of the center mirror component in a stationary non-rotating position is capable of exceeding a height of 50 .
mu.
m above the electrodes.
A MEMS mirror device fabrication method is disclosed.
A substrate is exposed selectively to form exposed regions and unexposed regions in the substrate.
Electrodes are formed supported by the substrate.
A mirror pattern having a center mirror component and a hinge pattern are formed supported by the substrate.
Portions of the substrate are removed in the exposed regions to form a support structure from the unexposed regions such that the support structure supports the mirror pattern and hinge pattern.
Another method for fabricating a MEMS mirror device is disclosed.
A release layer is formed on a first substrate.
A mirror pattern having a center mirror component and a hinge pattern are formed supported by the release layer.
Electrodes are formed supported by a second substrate.
A support structure is formed.
The first substrate is attached with the second substrate using the support structure.
The first substrate and the release layer are removed such that the support structure supports the mirror pattern and hinge pattern.
Another method for fabricating a MEMS mirror device is disclosed.
A release layer is formed on a first substrate.
A mirror pattern having a center mirror component and a hinge pattern are formed supported by the release layer.
Electrodes are formed supported by a second substrate.
A support structure is formed using a third substrate.
The first substrate is attached with the second substrate using the support structure

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