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Optical device, laser beam source, laser apparatus and method of producing optical device
| Details |
Inventors: Yamamoto, Kazuhisa; Mizuuchi, Kiminori; Kitaoka, Yasuo; Kato, Makoto;
Assignee: Matsushita Electric Industrial Co., Ltd. (Osaka, JP)
Primary Examiner: Whitehead, Jr.; Carl
Assistant Examiner: Rodgers; Colleen E.
Attorney, Agent or Firm: RatnerPrestia
After forming domain inverted layers 3 in an LiTaO.sub.3 substrate 1, an optical waveguide is formed. By performing low-temperature annealing for the optical wavelength conversion element thus formed, a stable proton exchange layer 8 is formed, where an increase in refractive index generated during high-temperature annealing is lowered, thereby providing a stable optical wavelength conversion element. Thus, the phase-matched wavelength becomes constant, and variation in harmonic wave output is eliminated. Consequently, with respect to an optical wavelength conversion element utilizing a non-linear optical effect, a highly reliable element is provided. |
|
DETAILED DESCRIPTION The invention claimed is: 1.
A method for producing an optical element, comprising: a step of forming a proton exchange layer in an LiNb.
sub.
xTa.
sub.
1-xO.
sub.
3 (0.
ltoreq.
X.
ltoreq.
1) substrate; a high-temperature annealing step of performing a heat treatment for the substrate at a temperature of 150.
degree.
C.
or higher; and a low-temperature annealing step of performing a heat treatment for the substrate at a temperature of 120.
degree.
C.
or lower for 1 hour or more so as to mitigate strain introduced in the proton exchange layer by the high-temperature annealing step.
2.
A method for producing an optical element according to claim 1, wherein the low-temperature annealing step is performed at a temperature equal to or higher than 50.
degree.
C.
but lower than or equal to 90.
degree.
C.
3.
A method for producing an optical element according to claim 1, wherein the low-temperature annealing step comprises a step of gradually lowering the temperature from 100.
degree.
C.
to 60.
degree.
C.
over 30 hours.
4.
A method for producing an optical element according to claim 1, further comprising: a step of forming a plurality of periodically-arranged domain inverted layers in the substrate.
5.
A method for producing an optical element, comprising: a step of performing a proton exchange process for an LiNb.
sub.
xTa.
sub.
1-xO.
sub.
3 (0.
ltoreq.
X.
ltoreq.
1) substrate; a first annealing step of performing a first heat treatment for the substrate at a first temperature, after performing the proton exchange process; and a second annealing step of performing a second heat treatment for the substrate at a second temperature, after performing the first heat treatment, wherein the second temperature is lower than the first temperature by 200.
degree.
C.
or more.
6.
A method for producing an optical element according to claim 5, wherein the second annealing step is performed at a temperature equal to or higher than 50.
degree.
C.
but lower than or equal to 90.
degree.
C.
Description:
TECHNICAL FIELD The present invention relates to an optical element such as an optical wavelength conversion element, a laser light source and a laser device suitable for use in the field of optical information processing or optical measuring control where coherent light is used, and also relates to a method for producing an optical element
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