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Home MEMS Staircase-avalanche-photodiode

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 Staircase avalanche photodiode

Details
Inventors: Tsuji, Masayoshi; Makita, Kikuo;
Assignee: NEC Corporation (Tokyo, JP)
Primary Examiner: Crane; Sara W.
Assistant Examiner: Tang; Alice W.
Attorney, Agent or Firm: Popham, Haik, Schnobrich & Kaufman, Ltd.

An avalanche photodiode is provided which consists of a staircase APD with a periodic multilayer structure graded in composition from InAlAs to InGa.sub.x Al.sub.(1-x) As (x>0.1) as the multiplication layer to improve the dark current characteristic. Another photodiode with separate photoabsorption and multiplication regions is provided with an electric-field relaxation layer whose bandgap is wider than that of the photoabsorption and has a triple structure with a highly-doped layer sandwiched between lightly-doped layers. This photodiode incorporates in detail on an n-type InP substrate, an avalanche multiplication layer 13 of a periodic multilayer structure graded in composition from n.sup.- -InAlAs to InGa.sub.x Al.sub.(1-x) As, a p.sup.- -InGaAs photoabsorption layer 17, and an InP electric-field relaxation triple layer 16 consisting of n.sup.-, p.sup.+, and p.sup.- layers between the avalanche multiplication layer 13 and the photoabsorption layer 17.

DETAILED DESCRIPTION It is the principal object of the present invention to solve the above-mentioned problems and to provide a staircase APD of lower noise and faster response.
A staircase APD according to the present invention comprises a photoabsorption layer and an avalanche multiplication semiconductor layer on a semiconductor substrate wherein the avalanche multiplication semiconductor layer is a periodic multilayer structure graded in composition from InAlAs to InGa.
sub.
x Al.
sub.
(1-x) As (0.
1<x<1).
Another APD according to the present invention comprises, on a semiconductor substrate, a photoabsorption layer, an avalanche multiplication semiconductor layer, and an electric-field relaxation layer sandwiched between the photoabsorption layer and the avalanche multiplication semiconductor layer wherein the bandgap of the electric-field relaxation layer is wider than the bandgap of the photoabsorption layer.
A further APD according to the present invention wherein the electronic-field relaxation layer having a bandgap wider than the bandgap of the photoabsorption layer has a structure with the highly-doped layer sandwiched between the lightly-doped layers.



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