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Color filter with resist material in scribe lines
A method for processing a semiconductor substrate comprises the steps of: providing a substrate having a plurality of scribe lines having a step height and arranged to ...
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Method and apparatus for preparing a plurality of dice in wafers
Methods and apparatuses for modulating an optical beam in an optical device are disclosed. In the following description numerous specific details are set forth in order ...
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Microchannel system for fluid delivery
The realization of a buried flow channel in silicon in accordance with the present invention, depends upon the anisotropy of the silicon etch rate in EDP. For example, ...
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Solid state ink jet print head and method of manufacture
Ink jet printing mechanisms use pens that shoot droplets of colorant onto a printable surface to generate an image. Such mechanisms may be used in a wide variety of ...
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Wafer level contact sheet and method of assembly
The present invention relates to a system and method for performing reliability screening on semi-conductor wafers that uses a highly planar burn-in apparatus. The burn-...
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Packaging micromechanical devices
Referring to FIG. 1, a 3.times.3 micromechanical mirror array is shown by way of example of a MEMS device array that is advantageously packaged according to the ...
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Gate stack for high performance sub-micron CMOS devices
A principle objective of the invention is to provide a gate electrode structure having sub-micron device feature lengths. Another objective of the invention is to ...
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Sensitivity control for nanotube sensors
In accordance with one aspect of the present invention an electronic system for detecting analytes is provided. The system includes a signal control and processing unit ...
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Method of etching crystalline material with etchant injection inlet
The present invention has been accomplished in view of the various points as described above, and its object is to provide a fine working method of a crystalline ...
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Selective formation of porous silicon
OF THE INVENTION The invention is based on forming a latent pattern in the surface of a silicon substrate that on exposure to etchant forms a pattern of porous silicon. ...
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