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Universal cold-cathode type ion source with closed-loop electron drifting and adjustable ion-emitting slit
| Details |
Inventors: Maishev, Yuri; Ritter, James; Velikov, Leonid;
Assignee: Advanced Ion Technology, Inc. (Fremont, CA)
Primary Examiner: Bettendorf; Justin P.
Assistant Examiner:
Attorney, Agent or Firm: Zborovsky; Ilya
A universal cold-cathode type ion source with a closed-loop electron drifting source and with an ion-beam propagation direction perpendicular to the plane of electron drifting is intended for uniformly treating stationary or moveable objects with such processes as cleaning, activation, polishing, thin-film coating, or etching. The ion source of the invention allows adjustment of beam parameters and configurations and has an ion emitting slit of an adjustable geometry. In one embodiment, the adjustment is carried out by changing the width of the slit by shifting moveable parts of the cathode in the direction perpendicular to the direction of the ion beam. In another embodiment the slit configuration is adjusted by shifting a moveable part of the cathode in the direction of the beam propagation. The invention also provides a method for adjusting the shape and configuration of the ion beam with respect to the object to be treated. The adjustment can be performed during the operation of the ion beam while observing the beam through a sealed transparent window of the vacuum chamber. |
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DETAILED DESCRIPTION OF THE INVENTION FIGS.
4, 4A, and 5--Ion Source with Adjustable Width of the Emitting Slit FIG.
4 is a sectional side view along the line IV--IV of FIG.
5 illustrating an ion-beam source according to one embodiment of the invention in which the width of an ion-emitting-slit is adjustable by shifting moveable parts of the cathode of the source in the direction perpendicular to the direction of the ion beam emitted by the source.
FIG.
5 is a sectional view along line V--V of FIG.
4.
To some extent, an ion-beam source 100 of this embodiment is similar to the known ion source with a circular ion-beam emission slit of the type shown and described in connection with FIGS.
1, 2, and 3.
The parts and units of ion-beam source 100 similar to those of FIGS.
1 through 3 will be designated by the same reference numerals with an addition of 100.
Thus, ion source 100 has a hollow cylindrical housing 140 made of a magnetoconductive material such as Armco steel which is used as a cathode.
As shown in FIG.
5 by broken lines, in the illustrated embodiment housing 140 has a substantially rectangular top-view configuration with side walls 143a, 143b, a closed flat bottom 144 (FIG.
4) and a flat top side 146 with a closed-loop ion emitting slit 152.
This slit has predetermined shape and geometric dimensions defined by its inner profile 152a and an outer profile 152b.
It is understood that the oval shape is shown in FIG.
5 only as an example and that the slit, as well as the cathode, anode, and permanent magnet may be of any required configuration such as circular, rectangular, elliptic, etc.
A working gas supply hole 153 is formed in bottom wall 144.
Flat top side 146 functions as an accelerating electrode.
Placed inside the interior of hollow cylindrical housing 140 between bottom 144 and top side 146 is a magnetic system which includes a permanent magnet 166 with poles N and S of opposite polarity.
The N-pole faces flat top side 146 and the S-pole faces bottom side 144 of the ion source
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MEMS 
