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Universal cold-cathode type ion source with closed-loop electron drifting and adjustable ionization gap
| Details |
Inventors: Maishev, Yuri; Ritter, James; Velikuv, Leonid;
Assignee:
Primary Examiner: Westin; Edward P.
Assistant Examiner: Patti; John
Attorney, Agent or Firm: Zborovsky; Iyla
A universal cold-cathode type ion source with closed-loop electron drifting and with ion-beam propagation direction perpendicular to the plane of electron drifting is intended for uniformly treating stationary or moveable objects. Treatment procedures include cleaning, activation, polishing, thin-film coating, or etching. The ion source of the invention allows for adjusting beam parameters and configurations and has an adjustable dimensions of the ionization space between the anode and the cathode. In a preferred embodiment, the adjustment is carried out by moving the anode with respect to the cathode. The moveable anode is shifted in the direction of propagation of the ion beam or in the opposite direction, whereby the tubular ion beam is either converged or diverged. As a result, it becomes possible to adjust the surface area being treated and characteristics of the ion beam such as average energy of ions in the beam and composition of the beam, in case of a multiple-component working medium. |
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DETAILED DESCRIPTION OF THE INVENTION FIGS.
4 to 8----Ion-Beam Source with Anode Moveable with Respect to Cathode FIG.
4 is a sectional side view of an ion-beam source according to an embodiment of the invention in which the geometrical dimensions of the ion-emitting space are adjusted by shifting a moveable anode with respect to the cathode in the direction of propagation of the ion beam or in the opposite direction.
To some extent, the ion-beam source 100 of this embodiment is similar to the known ion source with a circular ion-beam emission slit of the type shown and described in connection with FIGS.
1, 2, and 3.
The parts and units of ion-beam source 100 similar to those of FIGS.
1 through 3 will be designated by the same reference numerals with an addition of 100.
Thus, ion source 100 has a hollow rectangular housing 140 made of a magnetoconductive material such as Armco steel which is used as a cathode.
In the illustrated embodiment housing 140 has a substantially rectangular top-view configuration (FIG.
4A) with side walls 143a, 143b, a closed flat bottom 144, and a flat top side 146 with a closed-loop ion-emitting slit 152.
This slit has a predetermined shape and geometric dimensions which will be described later in connection with FIGS.
4A, 7 and 8.
A working gas supply hole 153 is formed in bottom wall 144.
Flat top side 146 functions as an accelerating electrode.
Placed inside the interior of hollow cylindrical housing 140 between bottom 144 and top side 146 is a magnetic system which includes a permanent magnet 166 with poles N and S of opposite polarity.
The N-pole faces flat top side 146 and the S-pole faces bottom side 144 of the ion source.
In the illustrated embodiment, magnet 166 is rigidly fixed between top side 146 and bottom 144.
The purpose of the magnetic system with a closed magnetic circuit formed by parts 166, 140, 152, and 144 is to induce a magnetic field in ion emission slit 152.
It is understood that this magnetic system is shown only as an example and that it can be formed in a different manner, e
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MEMS 
