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| Light absorptive antireflector |
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| Reflector |
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High efficiency reflectors and methods for making them
| Details |
Inventors: Hettich, Herbert L.; Pellicori, Samuel F.;
Assignee: Santa Barbara Research Center (Goleta, CA)
Primary Examiner: Kittle; John E.
Assistant Examiner: Rucker; Susan S.
Attorney, Agent or Firm: Schubert; W. C., Laslo; V. G., Karambelas; A. W.
An article of manufacture includes a substrate carrying at least two coating layers, one layer being of approximately quarter wave optical thickness, the other layer of approximately two quarter wave optical thickness, with the layers alternating between a material such as a dielectric having a first index of refraction and a second material such as a dielectric having a second index of refraction lower than the first index of refraction. These layers form a filtering system which removes narrow bands of light such as laser wavelengths by efficient reflection while permitting the remainder of the light spectrum to pass through the article. The coating layers have optical thicknesses and indices of refraction appropriate to reflect more than 99% of incident light at one or more predetermined wavelengths of light in the range of about 300 to about 1,200 nanometers and to transmit a substantial amount of all other incident light in the range. These articles are made by an electron beam evaporation technique under vacuum and under controlled conditions of temperature, partial pressure of oxygen, and deposition rates. |
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DETAILED DESCRIPTION What is claimed is: 1.
An article of manufacture comprising a substrate selected from the group consisting of glass and polymeric materials carrying at least two coating layers, one layer being of approximately quarter wave optical thickness, and the other being of approximately two quarter wave optical thickness, said layers alternating between a material having a first index of refraction and a material having a second index of refraction lower than said first index of refraction, said coating layers having optical thicknesses and indices of refraction suffficient to reflect more than 99% of incident light at substantially all wavelengths within one or more predetermined bandwidths of wavelengths, said bandwidths having a width of up to about 50 nanometers, and to transmit a substantial amount of all other incident light.
2.
The article of claim 1 futher comprising in the range of about 10 to about 20 repeating groups of said alternating coating layers.
3.
The article of claim 2 wherein said first index of refraction is in the range of about 1.
9 to about 2.
3, and said second index of refraction is in the range of about 1.
43 to about 1.
5.
4.
The article of claim 3 wherein said first layer is selected from the group consisting of tantulum oxide, titanium oxide and hafnium oxide, and said second layer is silicon dioxide or Schott evaporation glass 8329.
5.
The article of claim 4 wherein said article reflects more than 99% of incident light in narrow bandwidths of light wavelengths around 1,064 nanometers, 532 nanometers and 358 nanometers.
6.
The article of claim 5 wherein said narrow bandwidths are of sufficient breadth to reflect said more than 99% of incident light where the angle of incidence of said incident light is in the range of about 0.
degree.
to about 25.
degree.
.
7.
The article of claim 1 wherein each of said layers is a quarter wave optical thickness at a wavelength .
lambda.
.
sub.
0, and wherein said article has a reflection band of said more than 99% of incident light of at least one wavelength equal to 3
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Manufacturing Materials 
