Photosensitive composition with polymer having diazonium salt in side chain

Details

Inventors: Minamizono, Junji; Sekiya, Toshiyuki;
Assignee: Fuji Photo Film Co., Ltd. (Kanagawa, JP)
Primary Examiner:
Assistant Examiner:
Attorney, Agent or Firm:

A photosensitive composition containing a polymer, and a photosensitive material utilizing the composition are disclosed. The polymer, which may be in the form of a copolymer, includes a repeating unit of the formula (I): ##STR1## wherein Y is a divalent substituent; Z.sub.1 and Z.sub.2 independently each represents monovalent substituents; p and q are each 0 or an integer of 1 to 4; when p and q are each 2 or more, each of Z.sub.1 and Z.sub.2 may be the same or different; X.sup..crclbar. is an anion. The composition has high sensitivity and is capable of forming an image on a suitable photographic support without causing fog under incandescent lamps. The composition can be used to produce lithographic printing plates having high sensitivity as well as excellent ware resistance.

DETAILED DESCRIPTION OF THE INVENTION A preferred compound of formula (I) is such that B represents a substituted aralkylene group, C is --O--, l=0, and m=n=1.
Also preferred is a compound wherein Y is bonded to the phenyl group at para-position with respect to the NH group.
Illustrative monomers used to prepare the copolymer include acrylic acid, methacrylic acid, and their alkyl esters (e.
g.
methyl methacrylate, ethyl acrylate, hydroxyethyl acrylate, propyl acrylate, cyclohexyl acrylate, 2-ethylhexyl acrylate, decyl acrylate, .
beta.
-cyanoethyl acrylate, .
beta.
-chloroethyl acrylate, 2-ethoxyethyl acrylate and sulfopropyl methacrylate), vinyl esters (e.
g.
vinyl acetate, vinyl propionate and vinyl butyrate), vinyl ethers (e.
g.
methyl vinyl ether, butyl vinyl ether and oleyl vinyl ether), vinyl ketones (e.
g.
methyl vinyl ketone and ethyl vinyl ketone), styrenes (e.
g.
styrene, methylstyrene, dimethylstyrene, 2,4,6-trimethylstyrene, ethylstyrene, laurylstyrene, chlorostyrene, methoxystyrene, cyanostyrene, chloromethylstyrene, vinylbenzoic acid, styrene sulfonic acid and .
alpha.
-methylstyrene), vinyl heterocyclic compounds (e.
g.
vinylpyridine, vinylpyrrolidone and vinylimidazole), acrylonitrile, vinyl chloride, vinylidene chloride, ethylene, propylene, butadiene, diisobutylene, isoprene and chloroprene.
These are not the only monomers that can be used to prepare the copolymer according to the present invention, and any copolymer that has the repeating unit of formula (I) may be used.
The proportions of copolymerizable monomers and the molecular weight of the resulting copolymer can be properly selected from any range that satisfies the required sensitivity of the diazonium salt containing high-polymeric compoud, its resolution, and solubility in organic and other solvents.
For the purposes of the present invention, the copolymer preferably contains at least 40 mol% of the diazonium salt unit.
A preferred molecular weight ranges from several to several hundreds in terms of the degree of polymerization

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