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Apparatus for treating semiconductor wafers
| Details |
Inventors: Wills, James C.; Spenser, Douglas S.;
Assignee: Solitec, Inc. (Santa Clara, CA)
Primary Examiner: McIntosh; John P.
Assistant Examiner:
Attorney, Agent or Firm: Limbach, Limbach & Sutton
Apparatus for treating semiconductor wafers including a reciprocating wafer tray placed between a wafer loading station and a wafer unloading station. A station for applying photoresist and a station for heating the wafer in a vacuum chamber are placed between the loading station and the unloading station and in operative relationship to the reciprocating tray. The tray has at least three wafer carrying apertures and a pair of operating apertures located between the wafer carrying apertures. Chucks are provided at each treatment station. The wafer tray is reciprocated to feed wafers sequentially from the loading station, to the applying station, to the heating station, and then to the unloading station. |
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DETAILED DESCRIPTION What is claimed is: 1.
Apparatus for treating semiconductor wafers comprising a reciprocating wafer tray having at least three wafer carrying apertures, at least a pair of operating apertures each one located inbetween a different adjacent pair of said three wafer carrying apertures, and slots in the tray providing open access between at least certain of operating and carrying apertures; means for reciprocating said tray back and forth between an input loading station and an output unloading station; at least first and second treating stations inbetween said loading and unloading stations, each treating station having a wafer chuck vertically reciprocal through said operating apertures in said tray; said first treating station having means for applying photoresist to a wafer; and said second treating station having means for evacuating the space surrounding a wafer with applied photoresist and simultaneously conducting heat to the wafer from the wafer chuck.
Description:
The present application is directed to apparatus for treating semiconductors and more particularly to the application of a photoresist material to a wafer.
BACKGROUND OF INVENTION In processing semiconductor wafers a layer of photoresist is applied evenly to the surface of the wafer.
Problems have been encountered in rapidly drying the photoresist coating without adversely affecting the photoresist material and/or the wafer.
Drying techniques have included microwave heating of the photoresist or evacuating the space surrounding the wafer to draw off vapors.
SUMMARY OF THE INVENTION The object of the present invention is to provide an apparatus for rapidly drying a photoresist layer on a semiconductor.
Broadly stated, the present invention, to be described in greater detail below, is directed to apparatus for applying a photoresist material to a wafer and then simultaneously both conducting heat to the wafer and evacuating the space surrounding the wafer to dry the photoresist matrial on the wafer
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