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Home Nonmetallic Processes Double-channel-planar-buried-heterostructure-laser

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 Double channel planar buried heterostructure laser

Details
Inventors: Kitamura, Mitsuhiro; Mito, Ikuo; Kobayashi, Kohroh;
Assignee: Nippon Electric Co., Ltd. (Tokyo, JP)
Primary Examiner:
Assistant Examiner:
Attorney, Agent or Firm:

A buried heterostructure semiconductor laser diode with improved efficiency, CW operating temperature and output characteristic is comprised of a semiconductor substrate of a first conductivity type and includes successively at least a first cladding semiconductor layer of the first conductivity type, an active semiconductor layer, and a second cladding semiconductor layer of a second conductivity type. The active semiconductor layer has a narrower bandgap than those of the first and second cladding semiconductor layers. The multilayer double heterostructure has a stripe geometry with channels formed along both sides of the stripe and extending down to the first cladding layer. A current blocking layer is formed on the multilayer double heterostructure except for the top surface of the stripe geometry, in order to block a current flow therethrough.

DETAILED DESCRIPTION It is therefore an object of the present invention to provide a BH-LD in which blocking layers effectively function to enhance the temperature and output characteristics of the BH-LD to an unprecedented degree while also enhancing the reproducibility and yield of manufacture.
A semiconductor laser having a buried double heterostructure embodying the present invention includes a semiconductor substrate of a first conductivity type.
A multi-layer double heterostructure includes successively at least a first cladding semiconductor layer of the first conductivity type, an active semiconductor layer, and a second cladding semiconductor layer of a second conductivity type.
The active semiconductor layer has a narrower bandgap than those of the first and second cladding semiconductor layers.
The multi-layer double heterostructure has a stripe geometry with channels formed along both sides of the stripe and extending down to the first cladding layer.
A current blocking layer is formed on the multi-layer double heterostructure except for the top surface of the stripe geometry, in order to block a current flow therethrough.
A pair of electrodes supply a voltage to forward bias the semiconductor laser.
A p-n-p-n thyristor structure is generally analyzed using a model connection of a p-n-p transistor and an n-p-n transistor.
Concerning the characteristics of a thyristor itself, it is preferable that the thyristor turn-on voltage undergo a substantial change in response to a change in gate current.
This conflicts with the requirement that the turn-on voltage of a blacking layering in a semiconductor laser change little in response to a change in gate current.
Stated another way, a thyristor with poor performance is rather suitable for a blocking layer structure.
Such a thyristor is achievable by reducing the current gain of one or both of the p-n-p and n-p-n transistors.
It may roughly be said that the current gain of a transistor can be reduced by reducing the current carried by the minority carriers at the base relative to the total emitter current



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