|
|
Method for adjusting a semiconductor disk relative to a radiation mask in x-ray photolithography
It is an object of the invention to disclose an adjusting process for utilization in x-ray photolithography, in which a thin-etching process of the semiconductor disks ...
|
|
|
Apparatus and method for optical clearance determination
In carrying out one form of my invention, I provide apparatus for optically determining the clearance between an edge of at least one translating member and a relatively ...
|
|
|
Method for inspecting gear contact patterns
We claim: 1. Method for inspecting a gear contact pattern on a tooth surface of a gear tooth of a gear which comprises the steps of determining on the tooth surface of ...
|
|
|
Bow sight
An improved bow sight enables an archer to shoot with a high degree of accuracy. The bow sight provides ready adjustment to compensate for different shooting distances ...
|
|
|
Plasma pretreatment with BCl.sub.3 to remove passivation formed by fluorine-etch
Referring now to FIGS. 1 thru 4, there are shown cross-sectional views of portions of a partially completed exemplary VLSI silicon-gate MOS device 10 illustrating ...
|
|
|
Method of measuring the thickness of the removed layer in subtractive workpiece processing
It is the object of the invention to provide a method of measuring the removed layer thickness in subtractive workpiece processing which can be implemented reliably and ...
|
|
|
Method of planarizing the surface of a semiconductor device, in which silicon nitride is used as isolating material
What is claimed is: 1. In a method of planarizing the surface of a semiconductor device comprising a substrate carrying in relief on its surface at least one contact ...
|
|
|
Method of manufacture of EMI/RFI vapor deposited composite shielding panel
The process of this invention can be carried out with existing commercial vapor metalizing equipment. Preferably such equipment is modified to allow for dual firing of ...
|
|
|
High sensitivity positive resist layers and mask formation process
The resists useful in the practice of the invention are those which are degraded under high energy radiation at dosage levels above about 1 .times. 10.sup..sup.-6 ...
|
|
|
Two layer resist system
I claim: 1. A method for forming a composite layer of resist materials comprising: providing first and second resist materials, each resist material being a sensitized ...
|