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High sensitivity positive resist layers and mask formation process
The resists useful in the practice of the invention are those which are degraded under high energy radiation at dosage levels above about 1 .times. 10.sup..sup.-6 ...
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Two layer resist system
I claim: 1. A method for forming a composite layer of resist materials comprising: providing first and second resist materials, each resist material being a sensitized ...
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Color deepening agent
The embodiments of the invention in which an exclusive property or privilege is claimed are defined as follows: 1. A color deepening agent comprising (a) an aqueous ...
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Process for forming fine patterns
The present invention is aimed at solving these problems of the prior art methods and, to this end, it provides a process for forming a fine pattern having good ...
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Secondary lithium battery
What is claimed is: 1. A secondary lithium battery comprising: an anode active material selected from the group consisting of lithium, lithium ion dischargeable lithium ...
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Method for manufacturing a semiconductor device
It is an object of the present invention to provide a method for manufacturing a semiconductor device, wherein channel-cut regions are readily and uniformly formed ...
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Bipolar transistor process using sidewall spacer for aligning base insert
In the present invention, a sidewall spacer is formed on an emitter contact pedestal. This sidewall spacer serves as a self-aligned mask for the introduction of the ...
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Label applying devices for applying adhesive labels to articles
This invention provides a label applying device for applying adhesive labels to articles comprising; label holding means, means to supply labels one-by-one to the ...
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System for real-time monitoring the characteristics, variations and alignment errors of lithography structures
An object of the present invention is to provide a system for monitoring the optical parameters of a projection lithography system which uses the instant electrical ...
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Aligning exposure method
Accordingly, it is an object of the invention to provide a position detecting method possibly used in an aligning method which permits alignment of minute patterns, ...
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