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| Method for forming porous silicon dioxide insulators and related structures |
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| Method for making surfactant-templated, high-porosity thin films |
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| Porous silicon oxycarbide integrated circuit insulator |
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| Method of forming porous film and material for porous film |
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| Porous materials |
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| Process for producing nanoporous dielectric films at high pH |
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| Process for producing dielectric thin films |
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| Particles and a process for preparing the same |
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Transparent and semitransparent diffractive elements, particularly holograms and their making process
| Details |
Inventors: Vlcek, Miroslav; Sklenar, Ales;
Assignee: OVD Kinegram AG (Zug, CH)
Primary Examiner: Spyrou; Cassandra
Assistant Examiner: Juba, Jr.; John
Attorney, Agent or Firm: Hoffmann & Baron, LLP
Transparent and semitransparent diffractive elements, particularly holograms with a diffractive pattern created at least in one of two following layers with different index of refraction: a transparent bearing layer (1) from polymer or copolymer having index of refraction n<1.7, and a holographic effect-enhancing, high refraction index layer (2) formed by chalcogenide based substances comprising at least one element from the group sulphur selenium, tellurium, said layer (2) has n>1.7 and its melting temperature is lower than 900.degree. C. The diffractive element can further contain a protective layer (6) and/or an adhesive layer (7) and/or a fragile layer (8) and/or an anchoring layer (9). The diffractive pattern is either formed in said bearing layer (1) and subsequently a high refraction index layer (2) (comprising one or more layers chalcogenide based substances of different composition, which can be deposited subsequently or simultaneously) is deposited on the said layer (1), or said layer (2) is firstly deposited onto said layer (1) and diffractive pattern is mechanically formed into this system. |
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DETAILED DESCRIPTION What is claimed is: 1.
Diffractive elements consisting at least of two layers with a different index of refraction, whereof a first bearing layer is a transparent polymer or copolymer having index of refraction lower than 1.
7 and on said first bearing layer is deposited a second holographic effect enhancing, exposure-sensitive, high refraction index layer constituted by substances based on chalcogenides with an index of refraction higher than 1.
7 and a melting temperature lower than 900.
degree.
C.
, characterized in that a first diffractive pattern is mechanically shaped in at least one of the bearing layer and the high refraction index layer and at least one second diffractive pattern is formed in the exposure-sensitive, high refraction index layer, constituted by substances based on chalcogenides comprising at least one of the elements from the group sulphur, selenium, tellurium, the said chalcogenide based substances being selected from the group of binary, ternary and even more complex chalcogenide systems and/or ternary chalcogenide systems, containing, in addition to S or Se or Te, as a more electropositive element some of the elements Cu, Ag, Au, Hg, B, Al, Ga, In, Tl, Si Ge, Sn, Pb, N, P.
As, Sb, Bi.
2.
The diffractive elements according to claim 1, characterized in that the chalcogenide based substances further comprise a transient metal.
3.
The diffractive elements according to claim 1 characterized in that it further comprises a protecting layer, an adhesive layer, a fragile layer or an anchoring layer or a combination thereof.
4.
The diffractive elements according to claim 1 in which the first diffractive pattern is shaped in the said bearing layer and subsequently on said bearing layer thee said high refraction index layer is deposited characterized in that the at least one second diffractive pattern is formed in the said high refraction index layer, comprising at least one layer of chalcogenide based substances of different composition, which can be deposited subsequently or simultaneously
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Nonmetallic Processes 
