Crack opening displacement gage
To accomplish the foregoing and other objects of this invention there is provided a crack opening displacement gage which comprises a differential capacitive type sensor and a pair of arm means each h... Read More
Inventors: Egger, Richard L.;, Assignee: The Boeing Company (Seattle, WA) |
Self-contained modular pivot, notably for robots
This invention relates in general to articulations or like pivot means and has specific reference to a self-contained modular pivot intended for use notably in various mechanisms, especially in robots... Read More
Inventors: Pardo, Pierre; Pruvot, Francois;, Assignee: Sofermo (Meudon la Foret, FR) |
Apparatus and gauges for use in measuring the diameter of a buffed tire in relation to a particular matrix
I claim: 1. Apparatus for use in measuring the diameter of a tire of a particular nominal size that has been buffed and is to be provided with a predetermined thickness of uncured rubber applied by an... Read More
Inventors: Detwiler, Richard H.;, Assignee: Noyes Tire Co. (Westbrook, ME) |
Making memory structure for laser recording system
In accordance with the present invention, a thermoplastic memory is formed by depositing two layers of material upon a metallic substrate such as aluminum. The first or preliminary layer is a nonconfo... Read More
Inventors: Fechter, Henry G.;, Assignee: Teletype Corporation (Skokie, IL) |
Method for adjusting a semiconductor disk relative to a radiation mask in x-ray photolithography
It is an object of the invention to disclose an adjusting process for utilization in x-ray photolithography, in which a thin-etching process of the semiconductor disks or the radiation masks is not ne... Read More
Inventors: Tischer, Peter; Hundt, Eckart;, Assignee: Siemens Aktiengesellschaft (Berlin & Munich, DE) |
Apparatus and method for optical clearance determination
In carrying out one form of my invention, I provide apparatus for optically determining the clearance between an edge of at least one translating member and a relatively stationary second member. The ... Read More
Inventors: Mossey, Paul W.;, Assignee: General Electric Company (Cincinnati, OH) |
Method for inspecting gear contact patterns
We claim: 1. Method for inspecting a gear contact pattern on a tooth surface of a gear tooth of a gear which comprises the steps of determining on the tooth surface of the gear tooth a plurality of re... Read More
Inventors: Tanno, Takashi; Koike, Shigemitsu;, Assignee: Toyo Kogyo Co., Ltd. (Hiroshima, JP) |
Bow sight
An improved bow sight enables an archer to shoot with a high degree of accuracy. The bow sight provides ready adjustment to compensate for different shooting distances as well as for windage. A sight ... Read More
Inventors: Mathews, Nicholas A.;, Assignee: |
Plasma pretreatment with BCl.sub.3 to remove passivation formed by fluorine-etch
Referring now to FIGS. 1 thru 4, there are shown cross-sectional views of portions of a partially completed exemplary VLSI silicon-gate MOS device 10 illustrating various stages of an etching operati... Read More
Inventors: Kravitz, Stanley H.; Manocha, Ajit S.; Willenbrock, Jr., William E.;, Assignee: Bell Telephone Laboratories, Incorporated (Murray Hill, NJ) |
Method of measuring the thickness of the removed layer in subtractive workpiece processing
It is the object of the invention to provide a method of measuring the removed layer thickness in subtractive workpiece processing which can be implemented reliably and very easily without affecting t... Read More
Inventors: Brunsch, Arwed; Ruh, Wolf-Dieter; Trippel, Gerhard;, Assignee: International Business Machines Corporation (Armonk, NY) |
Method of planarizing the surface of a semiconductor device, in which silicon nitride is used as isolating material
What is claimed is: 1. In a method of planarizing the surface of a semiconductor device comprising a substrate carrying in relief on its surface at least one contact configuration cut out of a contact... Read More
Inventors: Fabien, Raymond; Decrouen, Jean-Michel;, Assignee: U.S. Philips Corporation (New York, NY) |
Method of manufacture of EMI/RFI vapor deposited composite shielding panel
The process of this invention can be carried out with existing commercial vapor metalizing equipment. Preferably such equipment is modified to allow for dual firing of the different metal layers and ... Read More
Inventors: Miller, Walter J.;, Assignee: Pennwalt Corporation (Philadelphia, PA) |
High sensitivity positive resist layers and mask formation process
The resists useful in the practice of the invention are those which are degraded under high energy radiation at dosage levels above about 1 .times. 10.sup..sup.-6 coulombs per square centimeter and w... Read More
Inventors: Moreau, Wayne M.; Ting, Chiu H.;, Assignee: International Business Machines Corporation (Armonk, NY) |
Two layer resist system
I claim: 1. A method for forming a composite layer of resist materials comprising: providing first and second resist materials, each resist material being a sensitized organic polymer capable of formi... Read More
Inventors: Feng, Bai-Cwo; Feng, George C.;, Assignee: International Business Machines Corporation (Armonk, NY) |
Color deepening agent
The embodiments of the invention in which an exclusive property or privilege is claimed are defined as follows: 1. A color deepening agent comprising (a) an aqueous resin composition obtained by radic... Read More
Inventors: Yagi, Kazuhisa; Suzuki, Sho; Nakashima, Norihiko;, Assignee: Kao Soap Co., Ltd. (Tokyo, JP) |
Process for forming fine patterns
The present invention is aimed at solving these problems of the prior art methods and, to this end, it provides a process for forming a fine pattern having good adhesiveness to resist layers and free ... Read More
Inventors: Umezaki, Hiroshi; Koyama, Naoki; Maruyama, Yoozi; Sugita, Yutaka;, Assignee: Hitachi, Ltd. (Tokyo, JP) |
Secondary lithium battery
What is claimed is: 1. A secondary lithium battery comprising: an anode active material selected from the group consisting of lithium, lithium ion dischargeable lithium alloys and lithium-doped high p... Read More
Inventors: Tobishima, Shin-ichi; Arakawa, Masayasu; Hirai, Toshiro; Yamaki, Jun-ichi;, Assignee: Nippon Telegraph & Telephone Corporation (Tokyo, JP) |
Method for manufacturing a semiconductor device
It is an object of the present invention to provide a method for manufacturing a semiconductor device, wherein channel-cut regions are readily and uniformly formed respectively on the side surfaces of... Read More
Inventors: Nagakubo, Yoshihide;, Assignee: Tokyo Shibaura Denki Kabushiki Kaisha (Kawasaki, JP) |
Bipolar transistor process using sidewall spacer for aligning base insert
In the present invention, a sidewall spacer is formed on an emitter contact pedestal. This sidewall spacer serves as a self-aligned mask for the introduction of the dopant for the base insert. The low... Read More
Inventors: Colinge, Jean-Pierre;, Assignee: Hewlett-Packard Company (Palo Alto, CA) |
Label applying devices for applying adhesive labels to articles
This invention provides a label applying device for applying adhesive labels to articles comprising; label holding means, means to supply labels one-by-one to the holding means oriented in one directi... Read More
Inventors: Eagle, Christopher R.;, Assignee: Portals Engineering Limited (Harwich, GB) |
System for real-time monitoring the characteristics, variations and alignment errors of lithography structures
An object of the present invention is to provide a system for monitoring the optical parameters of a projection lithography system which uses the instant electrical readout from an array of photosensi... Read More
Inventors: Lin, Burn J.; Taur, Yuan;, Assignee: International Business Machines Corporation (Armonk, NY) |
Aligning exposure method
Accordingly, it is an object of the invention to provide a position detecting method possibly used in an aligning method which permits alignment of minute patterns, particularly accurate and easy alig... Read More
Inventors: Nomura, Noboru; Kugimiya, Koichi; Matsumura, Takayoshi; Yonezawa, Taketoshi;, Assignee: Matsushita Electric Industrial Co., Ltd. (Osaka, JP) |
Measuring head
Based on this state of the art, it is the object of the invention to provide a measuring head of the aforementioned type, whereby it is possible to pass the measuring light reflected from a measuring ... Read More
Inventors: Mast, Fred; Knus, Jean A.;, Assignee: GRETAG Aktiengesellschaft (Regensdorf, CH) |
Optically readable information disc
OF THE INVENTION In a favourable embodiment the substrate plate is composed of 40-60% by weight of polymethylmethacrylate and 60-40% by weight of polyvinylchloride. A very suitable composition of the... Read More
Inventors: Lippits, Gerardus J. M.; Legierse, Petrus E. J.; Dujardin, George J. P.;, Assignee: U.S. Philips Corporation (New York, NY) |
Injection molding machines having a brushless DC drive system
Applicants desire to have the benefits of electric motor drives on an injection molding machine, but they wish to avoid the control complexity, higher cost and inherent power limitations of available ... Read More
Inventors: Faig, Harold J.; Sparer, Ronald M.;, Assignee: Cincinnati Milacron Inc. (Cincinnati, OH) |
Silylation process
What we claim is: 1. An improved process for the trimethylsilylation of organic compounds with at least one active hydrogen atom with hexamethyldisilazane, the improvement comprising effecting the rea... Read More
Inventors: Bruynes, Cornelis A.; Jurriens, Theodorus K.;, Assignee: Gist-Brocades N.V. (Delft, NL) |
Photographic element and patternable mordant composition
What is claimed is: 1. A photographically negative-working patternable mordant composition consisting essentially of a triplet sensitizer exhibiting an intersystem crossing efficiency from its singlet... Read More
Inventors: Snow, Robert A.; McGuckin, Hugh G.; Ponticello, Ignazio S.; Daly, Robert C.; Pace, Laurel J.; Fischer, Sandra K.; Hanrahan, Michael J.;, Assignee: Eastman Kodak Company (Rochester, NY) |
Apparatus for detecting a mutual positional relationship of two sample members
It is accordingly an object of this invention to provide a practical apparatus for detecting a mutual positional relationship of two members, which can highly accurately effect a positional alignment ... Read More
Inventors: Ono, Akira;, Assignee: Tokyo Shibaura Denki Kabushiki Kaisha (Kawasaki, JP) |
Alignment measuring system and method
Accordingly, it is a primary objective of the present invention to provide an alignment measuring device capable of automatically determining the alignment of two or more moving targets while the lugs... Read More
Inventors: Speiser, Benjamin T.;, Assignee: Apquip Corporation (Carmel Valley, CA) |
Snap-on flow measurement system
It is an object of the invention to provide a flow measurement system which non-invasively attaches to a conduit. It is another object of the invention to provide a flow measurement system with an eff... Read More
Inventors: Lynnworth, Lawrence C.;, Assignee: Panametrics, Inc. (Waltham, MA) |
Nonmetallic Processes 
