Material containing microaggregates of metals, inorganic compounds or organometallic compounds, more particularly usable in heterogeneous catalysis and its production process
The present invention relates to a material having microaggregates of metals, organometallic compounds or inorganic compounds, in which said microaggregates have substantially molecular dimensions and... Read More
Inventors: Barraud, Andre; Leloup, Jean; Ruaudel, Annie;, Assignee: Commissariat a l'Energie Atomique (Paris, FR) |
Amphiphilic polyimide precursor containing c12-c30 hydrophobic groups and langmuir-blodgett films therefrom
It has now been found that substituent groups for imparting a hydrophobic property to a polyamide acid can be introduced into the polyamide acid, and the monomolecular layer of the so modified polyami... Read More
Inventors: Uekita, Masakazu; Awaji, Hiroshi;, Assignee: Kanegafuchi Kagaku Kogyo Kabushiki Kaisha (Osaka, JP) |
Multilayer coating of a nitride-containing compound and method for producing it
What is claimed: 1. A multilayer coated substrate comprising a substrate coated with at least three layers of a nitride-containing compound wherein the composition of each layer is a nonstoichiometric... Read More
Inventors: Sue, Jiinjen A.; Troue, Harden H.;, Assignee: Union Carbide Coatings Service Technology Corporation (Danbury, CT) |
Method and apparatus for measuring registration between layers of a semiconductor wafer
OF THE INVENTION An automated system for measuring registration between layers of a semiconductor wafer is illustrated in FIGS. 1 and 2. The major elements of the system, including a wafer handler, a... Read More
Inventors: Into, Stephen W.;, Assignee: Interactive Video Systems, Inc. (Concord, MA) |
Image signal decoding apparatus
OF THE PREFERRED EMBODIMENT The preferred embodiment of the present invention will be described with reference to the accompanying drawings. FIG. 1 is a block diagram showing the structure of a decod... Read More
Inventors: Ishii, Yoshiki;, Assignee: Canon Kabushiki Kaisha (Tokyo, JP) |
Apparatus for measuring a shape
It to an object of the present invention is provide an apparatus for measuring shapes of bent bars or pipes having large bending curves and a number of bending portions in a short time. In accordance ... Read More
Inventors: Sano, Kazuo; Uesugi, Mitsuaki; Harayama, Masami; Okuno, Yoshihiro; Matsunaga, Hiroshi; Matsuju, Yoichi;, Assignee: NKK Corporation (Tokyo, JP) |
Method of manufacturing ceramic circuit board
An object of the present invention is to substantially eliminate the defects or drawbacks encountered in the prior art described above and to provide a method of preparing a ceramic circuit board capa... Read More
Inventors: Matsumura, Kazuo; Tanaka, Tadashi; Tsurutani, Shoji;, Assignee: Kabushiki Kaisha Toshiba (Kanagawa, JP) |
High stability interferometer for measuring small changes in refractive index and measuring method using the interferometer
An object of this invention is therefore to provide a high stability interferometer which is capable of measuring changes in refractive index as small as 10.sup.-7 or less, continuously and automatica... Read More
Inventors: Barnes, Thomas H.; Matsuda, Kiyofumi; Ooyama, Naotake;, Assignee: Agency of Industrial Science and Technology (Tokyo, JP); Ministry of International Trade and Industry (Tokyo, JP) |
Dry developable positive photoresists
OF THE INVENTION The novel copolymers of this invention are copolymers of certain compounds containing an acrylate moiety and a silicon-containing oxime ester of methacrylic acid. In terms of mole pe... Read More
Inventors: Meyer, Wolfgang H.; Curtis, Bernard J.;, Assignee: RCA Corporation (New York, NY) |
Rubber mixtures giving reversion-free vulcanizates and process of vulcanization
What is claimed is: 1. A composition which is a formable and vulcanisable rubber mixture comprising a rubber (A) which still contains double bonds and which can be cross-linked with sulphur and a vulc... Read More
Inventors: Wolff, Siegfried; Tan, Ewe-Hong;, Assignee: Degussa Aktiengesellschaft (Frankfurt am Main, DE) |
Method of fabricating print head for thermal printer
OF THE INVENTION First, a substrate of alumina is prepared. Then, the substrate is glazed. Thereafter, a thin metal film, preferably less than about 1 .mu.m thick, is formed over the whole glazed sur... Read More
Inventors: Kato, Masakazu;, Assignee: Alps Electric Co., Ltd. (JP) |
Non-parallax optical sighting instrument
Accordingly, it is an object of the invention to provide an improved optical sighting instrument which eliminates parallax. It is another object of the invention to provide an optical sighting instrum... Read More
Inventors: Whitman, III, Hobart A.;, Assignee: |
Method of and device for clamping a workpiece
OF THE INVENTION In FIGS. 1, 2 and 3 a device is illustrated for the aligned clamping of a workpiece shown schematically and the device includes a platform 1 mounted for rotation about three separate... Read More
Inventors: Pavlovsky, Rudolf; Wuest, Heinz;, Assignee: Georg Fischer Aktiengesellschaft (Schaffhausen, CH) |
Expansion sleeve for applying precise circumferential stress
In the invented expansive sleeve, or bushing, the stress surface, which is comprised in a cylindrical surface and is generally annular in form, is no longer subject to bowing and the formation of a pe... Read More
Inventors: Hofmann, Hans; Ziegler, Heinz;, Assignee: Emuge-Werk Richard Glimpel Fabrik fur Prazisionswerkzeuge (Lauf, DE) |
Method of and apparatus for producing embossing tools
I claim: 1. A method of making a large-format surface-texture embossing tool free from pattern-separating lines for the embossing plates, sheets, or foils, said method comprising the steps of: (a) jux... Read More
Inventors: Werthmann, Wilfried;, Assignee: Firma Standex International GmbH (Krefeld, DE) |
Plasma etching using a bilayer mask
The present invention provides for high resolution plasma etching of a primary layer on a semiconductor substrate and is particularly suitable for forming submicron geometries. The present invention u... Read More
Inventors: Cleeves, James M.; Heard, James G.; Tan, Zoilo C. H.;, Assignee: National Semiconductor Corp. (Santa Clara, CA) |
Method of cleaning a plurality of semiconductor devices
OF THE PREFERRED EMBODIMENT Referring now to FIG. 2, there is shown a perforation etch formed through the use of the hereinafter described method. Initially, a plurality of epitaxial layers 12 are gr... Read More
Inventors: Herrick, Robert W.; Levy, Joseph L.; Krebs, Danny J.;, Assignee: McDonnell Douglas Corporation (St. Louis, MO) |
Method of forming electrode pattern of semiconductor device
It is an object of the present invention to provide a method of forming an electrode pattern having a high bonding strength to a GaAs semiconductor substrate. It is another object of the present inven... Read More
Inventors: Kishita, Yoshihiro; Furukawa, Motoki; Mitani, Tatsuro;, Assignee: Kabushiki Kaisha Toshiba (JP) |
Rapid solidification processing of oxide superconductors
What is claimed is: 1. Method for processing a copper-containing superconducting oxide comprising: melting the oxide in an oxygen-rich environment; rapidly solidifying the oxide at a rate greater than... Read More
Inventors: Kalonji, Gretchen; McKittrick, Joanna; Sasayama, Shinichi;, Assignee: Massachusetts Institute of Technology (Cambridge, MA) |
Formation of superconducting articles by electrodeposition
What is claimed is: PG,18 1. A method for forming an oxide superconducting material on an article comprising the steps of: (a) preparing a mixture of coponents needed to synthesize the oxide supercond... Read More
Inventors: Schmidt, Ferenc;, Assignee: Ametek, Inc. (New York, NY) |
Method for manufacturing oxide superconducting films by laser evaporation
As an exemplified embodiment, a material of the composition Me1-Me2-Cu-O is selected, whereby Me1 is especially selected out of the group of rare earth metals, such as for example Y, and Me2 is selec... Read More
Inventors: Roas, Bernhard; Endres, Gerhard; Schultz, Ludwig;, Assignee: Siemens Aktiengesellschaft (Munich, DE) |
Methods of forming a patterned metal film on a support
I have found that a pattern of metal can be applied to a substrate in a wholly additive process which pattern can be of high resolution and which does not result in unwanted lowering of the surface re... Read More
Inventors: Sawyer, Ernest W.;, Assignee: Western Electric Company, Inc. (New York, NY) |
Integrated circuit having polyimide/metal passivation layer and method of manufacture using metal lift-off
Briefly, the invention is a process for passivating an integrated circuit. A layer of polyimide is applied to the surface of an integrated circuit followed by a layer of photo-resist. Areas of the pho... Read More
Inventors: Altman, Leonard F.; Moore, Kevin D.; Shurboff, John D.;, Assignee: Motorola, Inc. (Schaumberg, IL) |
Radiation-polymerizable mixture and copying material produced comprising polyurethane-polyurea polymer
OF PREFERRED EMBODIMENTS The polyurethanes used in the mixture according to the invention are saturated compounds, i.e. they do not contain any aliphatic C--C double bonds, in particular any polymeri... Read More
Inventors: Joerg, Klaus; Zertani, Rudolf;, Assignee: Hoechst Aktiengesellschaft (Frankfurt am Main, DE) |
Image forming process with photopolymer layers between a support and a substrate
OF PREFERRED EMBODIMENTS In each layer of the photosensitive element, namely the layers shown as 3.sub.1, 3.sub.2 . . . 3.sub.n-1, and 3.sub.n in the FIGURE, the kind of ingredients such as addition ... Read More
Inventors: Takeda, Keiji; Murata, Masataka; Ikeda, Teppei;, Assignee: Fuji Photo Film Co., Ltd. (Minami-ashigara, JA) |
Method for making linings and coatings from soluble cross-linkable perfluorocarbon copolymers
What is claimed is: 1. A method for coating a substrate with a soluabilized cross-linkable perfluorocarbon copolymer having pendant sulfonyl halide functional groups and polymerized from at least two ... Read More
Inventors: Baczek, Stanley K.; McCain, G. Howard; Benezra, Leo L.; Covitch, Michael J.;, Assignee: Diamond Shamrock Corporation (Dallas, TX) |
Method of making an electroluminescent display device with islands of light emitting elements
In accordance with the present invention, an electroluminescent display is provided comprising a matrix of individual light-emitting elements in a row and column formation and adapted for excitation f... Read More
Inventors: Topp, Mark; Hadden, Sam;, Assignee: Cordis Corporation (Miami, FL) |
Semiconductor crystal pulling method
An object of this invention is to provide a novel crystal pulling method by which substantially 100% of yield with respect to the resistivity of crystal can be attained. More specifically, an object o... Read More
Inventors: Yamashita, Youji; Kojima, Masakatu;, Assignee: Kabushiki Kaisha Toshiba (Kawasaki, JP) |
Method of manufacturing a flexure hinge assembly
We claim: 1. A method of fabricating a flexure hinge assembly comprising the steps of: temporarily and releasably securing a pair of tubular members in a coaxially concentric aligned first relative an... Read More
Inventors: Craig, Robert J. G.; Council, Clifton T.; Jansen, Jack F.;, Assignee: Litton Systems, Inc. (Woodland Hills, CA) |
Vortex shedding flowmeter
Accordingly, it is a general object of the present invention to provide a novel and useful vortex shedding flowmeter in which the disadvantages described heretofore are eliminated. Another and more sp... Read More
Inventors: Amemori, Hiroyuki; Nishiyama, Shigeru; Iwamoto, Tetsuo;, Assignee: Tokico Ltd. (JP) |
Nonmetallic Processes 
