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Log-time-processing-and-stitching-system

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Log time processing and stitching system

Details

Inventors: Canata, Philip Eugene;
Assignee: Applied Science Fiction, Inc. (Austin, TX)
Primary Examiner: Lee; Cheukfan
Assistant Examiner:
Attorney, Agent or Firm: Galasso; Raymond M. Simon, Galasso & Frantz PLC

A log-time stitching system provides for directly determining an accurate pixel exposure for each pixel in a recorded image. The present invention provides a digital processing system in which signals associated with a pixel are obtained at each of a plurality of different development times of the film being developed. A regression analysis that compares these different development times versus the natural log of time is made, to obtain a best fit line of this data, which line is then used to determine a "b" value. This "b" value or "fitting constant" corresponds to the intersection of the y-intercept and the best fit line. It has been discovered that this "b" value is substantially directly proportional to the log exposure of the pixel. Accordingly, this "b" value can be directly used to determine an appropriate exposure of the pixel.

DETAILED DESCRIPTION It is an object of the present invention to provide a method of directly determining the exposure, or brightness, of a given pixel of data associated with a portion of a scanned image of a developing negative.
It is a further object of the present invention to directly determine exposure information associated with each layer of a multi-layer color film, for each pixel.
These and other advantages are provided for by the present invention through a digital processing system in which signals associated with a pixel are obtained at each of a plurality of different development times of the film being developed.
A regression analysis that compares these different development times versus the natural log of time is made, to obtain a best fit line of this data, which line is then used to determine a "b" value.
This "b" value or "fitting constant" preferably corresponds to the intersection of the y-intercept and the best fit line.
It has been discovered that this "b" value is substantially directly proportional to the log exposure of the pixel.
Accordingly, this "b" value can be directly used to determine the appropriate exposure of the pixel.

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