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 Manufacturing method for a hologram and a related exposure apparatus

Details
Inventors: Kurokawa, Kazumasa; Kanda, Tomoyuki; Ishizuka, Atsuo; Shiozawa, Masahiro;
Assignee: Denso Corporation (Kariya, JP); Nippon Soken, Inc. (Nishio, JP)
Primary Examiner: Spyrou; Cassandra
Assistant Examiner: Treas; Jared
Attorney, Agent or Firm: Pillsbury Madison & Sutro LLP

A coherent beam is converted into a light flux having an expanded width at a predetermined position closer to a photosensitive element. Part of the expanded light flux is irradiated directly on the photosensitive element as a reference beam. The remainder of the expanded light flux is diffused, and its optical direction is changed. Thus, the remainder of the expanded light flux not irradiated directly to the photosensitive element is converted into a scattered beam advancing as an object beam toward the photosensitive element. Interference fringes are formed on the photosensitive element by using the reference beam and the object beam.

DETAILED DESCRIPTION Accordingly, in view of the above-described problems encountered in the related art, a principal object of the present invention is to provide a hologram manufacturing method capable of preventing interference fringes formed on a photosensitive element from being disturbed by the fluctuations of intervening medium residing along the optical path, and efficiently forming holograms with sharp interference fringes, and a related exposure apparatus.
Another object of the present invention is to reduce the length of the separated optical paths after the beam is separated, to reduce the phase difference between the reference beam and the object beam, and to realize a holographic screen free from the fluctuation of intervening medium residing along the optical path.
Still another object of the present invention is to flexibly change the incident direction of the object beam advancing to the photosensitive element to adjust the view region of the holographic screen.
Yet another object of the present invention is to stabilize the formation of interference fringes during an exposure operation, and to increase the transparency of a resultant holographic screen.
Moreover, another object of the present invention is to form a holographic screen along an entire surface of a large-scale photosensitive element, and to form interference fringes at different local spots of the photosensitive element by a single exposure operation.
And further, another object of the present invention is to form the interference fringes successively along the photosensitive element to manufacture a large-scale holographic screen.
In order to accomplish the above and other related objects, a first aspect of the present invention provides a manufacturing method for Fresnel's holographic screens comprising the following steps.
First, a coherent beam is converted into a light flux having an expanded width at a predetermined position to a photosensitive element.
Next, part of the expanded light flux, as a reference beam, is irradiated directly on the photosensitive element



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