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 Non-volatile semiconductor memory capable of readily erasing data

Details
Inventors: Miyamoto, Hiroshi;
Assignee: Mitsubishi Denki Kabushiki Kaisha (Tokyo, JP)
Primary Examiner: Hecker; Stuart N.
Assistant Examiner: Bowler; Alyssa H.
Attorney, Agent or Firm: Lowe, Price, LeBlanc, Becker & Shur

An EPROM in which data can be easily erased comprises a P type semiconductor substrate; source.drain regions formed on a main surface of the P type semiconductor substrate, a floating gate for storing charges representing information formed on a region sandwiched by the source.drain regions with an insulating film interposed therebetween, a superconductive material which will be the switching device formed on the floating gate, and a control gate formed on the superconductive material. In the normal operation, the superconductive material is non-conductive, so that the charges representing information are held in the floating gate. When the charges representing information in the floating gate should be erased, the whole EPROM is cooled, and the charges are discharged through the superconductive material and the control gate. By the use of a superconducting material in this fashion, other structures enabling erasure such as UV-radiation windows and tunnel oxide films may be omitted without increasing the chip area of the non-volatile memory.

DETAILED DESCRIPTION Therefore, one object of the present invention is to provide a non-volatile semiconductor memory in which the area occupied by one memory cell can be reduced.
Another object of the present invention is to provide a non-volatile semiconductor memory which is inexpensive.
A further object of the present invention is to provide a non-volatile semiconductor memory in which data can be erased without using ultraviolet rays.
A still further object of the present invention is to provide a non-volatile semiconductor memory whose package is inexpensive.
A still further object of the present invention is to provide a non-volatile semiconductor memory in which data can be erased by using switching means.
A still further object of the present invention is to provide a non-volatile semiconductor memory in which data can be erased by using a superconductive material.
The above described objects of the present invention can be attained by a non-volatile semiconductor memory comprising: a semiconductor substrate having a main surface and a predetermined impurity concentration of a first conductivity type; impurity regions of a second conductivity type formed spaced apart with each other on the main surface of the semiconductor substrate, a space between the impurity regions of the-second conductivity type defining a channel region; a first conductive layer formed at least on the channel region with an insulating film interposed therebetween; a second conductive layer extending near the first conductive layer and maintained at a prescribed potential; a third conductive layer formed on the first conductive layer with an insulating film interposed therebetween; and switching means for connecting the first conductive layer and the second conductive layer.
Since the non-volatile semiconductor device comprises the above described components, the charges representing information held in the first conductive layer is discharged through the second conductive layer by the operation of the switching device



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