Symmetrically clamped fiber optic receiver |
| The design that is discussed herein takes advantage of the fact that most data bus protocols use ... |
|
Microminiature optical assembly |
| For purposes of a specific illustrative example, emphasis herein will be directed to particular ... |
|
Semiconductor diode laser having a stepped effective refractive index |
| We claim: 1. A semiconductor diode laser comprising a semiconductor body (30) having a ... |
|
Electronic cooling |
| (1) New and Different Function I have discovered that electronic components are more advantageously ... |
|
Laminated capacitor of feed-through type |
| The present invention has been developed with a view to substantially solving the above described ... |
|
Magneto-optic light deflector system |
| In the present invention a coherent, transmitted light, e.g., laser, beam is linearly polarized by ... |
|
Solid state laser device for lithography light source and semiconductor lithography method |
| What is claimed is: 1. A solid state laser device useful as a light source for lithography: ... |
|
Apparatus for cooling integrated circuit chips |
| In one aspect of the present invention, this is accomplished by providing an apparatus for cooling ... |
|
Cooled stack of electrically isolated semiconductors |
| I claim: 1. A heat sink structure comprising: a thin sheet of electrical insulating material; first ... |
|
Apparatus and method of automatically separating stacked wafers |
| It is an object of the present invention to provide an apparatus which avoids these disadvantages ... |
|
|
Blue light-emitting device
| Details |
Inventors: Nitta, Koichi;
Assignee: Kabushiki Kaisha Toshiba (Kawasaki, JP)
Primary Examiner: Jackson; Jerome
Assistant Examiner:
Attorney, Agent or Firm: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
There is disclosed a blue light emitting device having a laminated structure, which comprises a buffer layer made of a first conductivity type GaN-based semiconductor, a first cladding layer made of the first conductivity type GaN-based semiconductor, an active layer made of a substantially intrinsic GaN-based semiconductor, and a second cladding layer made of a second conductivity type GaN-based semiconductor, on a conductive substrate such as a conductive sapphire substrate. The GaN-based semiconductors of the present invention are made of quaternary compound semiconductor layers, and preferably made of In.sub.x A.sub.y Ga.sub.1-x-y N whose mole fraction values x, y satisfy 0.ltoreq.x.ltoreq.1, 0.ltoreq.y.ltoreq.1 and x+y.ltoreq.1. The mole fraction values x, y are selected to obtain desired luminous wavelength and intensity. |
|
DETAILED DESCRIPTION An object of the present invention is to provide a blue light emitting device capable of adjusting wavelength freely without reducing intensity of the light to be generated. Another object of the present invention is to provide a blue light emitting device a chip size of which can be reduced. Still another object of the present invention is to provide a blue light emitting device which may be manufactured by virtue of simple manufacturing steps. Yet still another object of the present invention is to provide a blue light emitting device which is fitted for an integrated circuit. In order to attain the above objects, the blue light-emitting device according to the present invention is chracterized by comprising quaternary compound semiconductor layers shown in FIG. 2. In other words, the blue light-emitting device such as LED according to the present invention has a laminated structure in which, on a conductive substrate 100 are formed in sequence a buffer layer 101 made of a first conductivity type GaN-based semiconductor, a first cladding layer 102 made of a first conductivity type GaN-based semiconductor, an active layer 103 made of a GaN-based semiconductor which is substantially intrinsic, i. e. , in which impurity is not doped intentionally, and a second cladding layer 104 made of a second conductivity type GaN-based semiconductor which has opposite conductivity to the first conductivity. An upper electrode 105 is formed on the second cladding layer 104, while a lower electrode 106 is formed almost on the overall bottom surface of the conductive substrate 100. These GaN-based compound semiconductors are formed of quaternary compound semiconductor of In. sub. x Al. sub. y Ga. sub. 1-x-y N. Respective mole fraction x, y are selected as predetermined values to satisfy 0. ltoreq. x. ltoreq. 1, 0. ltoreq. y. ltoreq. 1 and x+y 1. For example, the first conductivity type signifies n-type while the second conductivity signifies p-type conductivity. But the n-type and the p-type may be reversed
|
|