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 Forming of contoured irradiated regions in materials such as semiconductor bodies by nuclear radiation

Details
Inventors: Bartko, John; Schlegel, Earl S.;
Assignee: Westinghouse Electric Corp. (Pittsburgh, PA)
Primary Examiner: Rutledge; L. Dewayne
Assistant Examiner: Roy; Upendra
Attorney, Agent or Firm: Menzemer; C. L.

Irradiated regions are formed in materials such as semiconductor bodies by nuclear radiation where the irradiated regions are of a desired thickness, dosage and dosage gradient, a desired distance from a selected surface of the material. A nuclear radiation beam from a given radiation source radiating particles with molecular weight of at least one (1) is provided that can penetrate the material through a selected surface to a depth greater than the maximum depth of the irradiated region from the selected surface. A beam modifier is formed of a given material and non-uniform shape to modify the energy of the radiation beam on transmission therethrough to form a transmitted radiation beam capable of forming an irradiated region of a desired thickness and dosage gradient in the material a given distance from the selected surface on irradiation of the material through the selected surface with the transmitted radiation beam. The material in which the desired irradiated region is to be formed is positioned with the selected surface thereof to be exposed to the radiation beam from the radiation source on transmission through the beam modifier. The material is thereafter irradiated through the beam modifier and through the selected surface with the radiation beam, preferably while the beam modifier and material are moved relative to each other through a predetermined motion, to form in the material an irradiated region of desired thickness, dosage and dosage gradient, a desired distance from the selected surface. The irradiated region thus formed in semiconductor bodies are particularly of value in changing the electrical characteristics without substantial change of other electrical characteristics.

DETAILED DESCRIPTION The present invention provides a method of forming an irradiated region of a desired thickness, dosage and dosage gradient in a material such as semiconductor body a desired distance from a selected surface thereof.
The invention is particularly useful in tailoring irradiated regions to simulate radiation effects on material properties produced by fast neutrons of a fusion reaction, and in forming irradiated regions changing the electrical characteristics of semiconductor bodies without affecting other electrical characteristics of the body.
The method is commenced by providing a radiation beam from a given radiation source radiating particles with molecular weight of at least one (1) capable of penetrating a material wherein an irradiated region is to be formed though a selected surface to greater than the maximum desired distance of the irradiated region from the selected surface.
Preferably, such nuclear radiation source is protons or alpha particles produced by a Van de Graaff accelerator forming a substantially monoenergetic radiation beam.
Such radiation sources can be produced relatively inexpensively, and are substantially chemically and electrically inactive on irradiation into the material.
A beam modifier of a given material and nonuniform shape is formed to modify the energy of the radiation beam on transmission therethrough.
Preferably the beam modifier is made of material such as aluminum to reduce scattering and provide good resolution for a transmitted radiation beam.
The beam modifier is of a shape to form a transmitted radiation beam capable of forming an irradiated region of a desired thickness and dosage gradient in the material a given distance from the selected surface on irradiation of the material through the selected surface with the transmitted radiation beam.
Almost any reasonable distance between the irradiated region and selected surface and any reasonable thickness of the irradiated region is possible provided the radiation source emits particles of energy sufficient to penetrate to the maximum depth of the irradiated region from the selected surface



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