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Method of making substantially linear field-effect transistor
The device and the method of making the same discussed in this application has substantial commonality with the devices, and method of making those devices, as ...
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Method of making a III-V complementary heterostructure device with compatible non-gold ohmic contacts
Briefly stated, the scope of the present invention encompasses a III-V complementary semiconductor device employing compatible ohmic contacts. Specifically, a preferred ...
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SiC/111-V-nitride heterostructures on SiC/SiO.sub.2 /Si for optoelectronic devices
These problems and needs will be met in accordance with a preferred embodiment of the invention by converting 100% of a 100-500 .ANG. layer of Si of a silicon-on-...
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Separation of thin films from transparent substrates by selective optical processing
The invention may be summarized as a method of transferring a crystalline film from a growth substrate to an acceptor substrate. The film of one composition is grown on ...
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Apparatus comprising refractive means for elections
OF SOME EXEMPLARY EMBODIMENTS Before describing some currently preferred embodiments we will derive expressions describing the effect of a potential step on the ...
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Nonvolatile ferroelectric memory and a method of manufacturing the same
Therefore, the present invention is directed to solve the problems of the conventional FRAM and is to provide a nonvolatile ferroelectric memory device having SWL ...
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Filamentary electron-emission device having self-aligned gate or/and lower conductive/resistive region
What is claimed is: 1. A structure comprising: a substrate for providing structural support; a lower electrically conductive region comprising a group of generally ...
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Methods of forming materials within openings, and method of forming isolation regions
In one aspect, the invention encompasses a method of forming a material within an opening. An etch-stop layer is formed over a substrate. The etch-stop layer has an ...
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PROCESS FOR FORMING THIN GATE OXIDE WITH ENHANCED RELIABILITY BY NITRIDATION OF UPPER SURFACE OF GATE OF OXIDE TO FORM BARRIER OF NITROGEN ATOMS IN UPPER SURFACE REGION OF GATE OXIDE, AND RESULTING PRODUCT
The invention comprises a process for inhibiting the passage of dopant from a thin polysilicon gate electrode into a thin gate oxide beneath the gate electrode, and ...
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Single mask process for forming both n-type and p-type gates in a polycrystalline silicon layer during the formation of a semiconductor device
An object of the invention is to provide a process for forming a layer of polycrystalline silicon having both p-type and n-type conductivity using a single mask step. T...
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