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 Logic circuit using vertically stacked heterojunction field effect transistors

Details
Inventors: Zhu, X. Theodore; Abrokwah, Jonathan K.; Goronkin, Herbert; Ooms, William J.; Shurboff, Carl L.;
Assignee: Motorola, Inc. (Schaumburg, IL)
Primary Examiner: Hille; Rolf
Assistant Examiner: Fahmy; Wael
Attorney, Agent or Firm: Barbee; Joe E.

Logic circuits using a heterojunction field effect transistor structure having vertically stacked complementary devices is provided. A P-channel quantum well and an N-channel quantum well are formed near each other under a single gate electrode and separated from each other by a thin layer of barrier material. P-source and P-drain regions couple to the P-channel. N-source and N-drain regions couple to the N-channel. The P-source/drain regions are electrically isolated from the N-source/drain regions so the P-channel and N-channel devices may be interconnected to provide many logic functions.

DETAILED DESCRIPTION The advantages of the present invention are achieved by a heterojunction field effect transistor structure having vertically stacked complementary devices.
A P-channel quantum well and an N-channel quantum well are formed near each other under a single gate electrode and separated from each other by a thin layer of barrier material.
P-source and P-drain regions couple to the P-channel.
N-source and N-drain regions couple to the N-channel.
The P-source/drain regions are electrically isolated from the N-source/drain regions so that the P-channel and N-channel devices may be interconnected to provide many logic functions.



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