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Method for imparting improved discoloration resistance to articles |
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Spin castable mixtures useful for making deep-UV contrast enhancement layers |
| What is claimed and sought to be protected by Letters Patent of the United States is as follows: 1. ... |
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Novel bis-onium salts and the use thereof as photoinitiators
| Details |
Inventors: Saeva, Franklin D.;
Assignee: Eastman Kodak Company (Rochester, NY)
Primary Examiner: McCamish; Marion E.
Assistant Examiner: RoDee; C.
Attorney, Agent or Firm: Webster; Ogden H.
Bis-sulfonium, -selenonium, -arsonium, -ammonium, and -phosphonium salts useful as photoinitiators, comprise: an aromatic or heterocyclic aromatic group which absorbs UV or visible radiation and which exhibits a higher energy occupied molecular orbital than at least one other substituent attached to each of the S, Se, As, N or P atoms of said salt; at least one substituent, attached to each of the S, Se, As, N or P atoms of said salt, which comprises an electron-withdrawing group which causes the lowest unoccupied molecular orbital to be localized on the substituent and the S, Se, As, N or P atom of the salt; an insulating group which links said aromatic or heterocyclic aromatic group to each of the S, Se, As, N, or P atoms of said salt, said insulating group essentially preventing .pi. resonance between said aromatic or heterocyclic aromatic group and the other substituents in said salt; and two anions; said salt being capable, upon exposure to UV or visible radiation absorbed by said aromatic or heterocyclic aromatic group, of forming a Bronsted acid. The invention also relates to the use of such photoinitiators. |
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DETAILED DESCRIPTION What is claimed is: 1. A composition of matter comprising a material curable by a Bronsted acid, and a bis-sulfonium, -selenonium, -arsonium, -ammonium, or -phosphonium salt comprising: an aromatic or heterocyclic aromatic group which absorbs UV or visible radiation and which exhibits a higher energy occupied molecular orbital than at least one substituent attached to each of the S, Se, As, N or P atoms of said salt; at least one substituent, attached to each of the S, Se, As, N or P atoms of said salt, which comprises an electron-withdrawing group which causes the lowest unoccupied molecular orbital to be localized on the substituent and the S, Se, As, N or P atom of the salt; an insulating group which links said aromatic or heterocyclic aromatic group to each of the S, Se, As, N, or P atoms of said salt, said insulating group essentially preventing x resonance between said aromatic or heterocyclic aromatic group and the other substituents in said salt; and two anions; said salt being capable, upon exposure to UV or visible radiation absorbed by said aromatic or heterocyclic aromatic group, of forming a Bronsted acid. 2. A composition of matter comprising a material curable by a Bronsted acid, and a compound which has one of the following formulas: ##STR14## wherein: R. sub. 1 represents an electron donating aromatic or heterocyclic aromatic group which absorbs UV or visible radiation and which exhibits a higher energy occupied molecular orbital greater than R. sub. 3 and R. sub. 6 ; R. sub. 2 and R. sub. 5 each, independently, represent the same substituent as R. sub. 3 or R. sub. 6 or an alkyl group having from 1 to 18 carbon atoms; L. sub. 1 and L. sub. 2 each, independently, represent a linking group which essentially prevents . pi. resonance between R. sub. 1 and the remainder of the compound; R. sub. 3 and R. sub. 6 each, independently, represent an electron withdrawing alkyl, aryl or heterocyclic group, which electron withdrawing group causes the lowest unoccupied molecular orbital to be localized on R
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