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 Organic solvent-soluble photosensitive polyamide resin

Details
Inventors: Nakano, Tsunetomo; Yasuno, Hiroshi; Nishio, Kazuaki;
Assignee: UBE Industries, Ltd. (Yamaguchi, JP)
Primary Examiner:
Assistant Examiner:
Attorney, Agent or Firm:

An organic solvent-soluble photosensitive polyamide resin usable for producing photoset resin product having excellent heat resistance and electrical and mechanical properties, comprising a polycondensation product of an aromatic dicarboxylic acid component with an aromatic diamine component consisting of 10 to 100 molar % of a photosensitive diamine compound of the formula (I) and 10 to 90 molar % of a non-photosensitive diamine compound of the formula (II), H.sub.2 N--R.sub.1 --NH.sub.2 (I) H.sub.2 N--R.sub.2 --NH.sub.2 (II) wherein R.sub.1 represents an aromatic divalent residue having a photosensitive radical and R.sub.2 represents an armoatic divalent residue having no photosensitive radical.

DETAILED DESCRIPTION We claim:
TABLE 3
__________________________________________________________________________
Example
1 2 3 4 5 6 7 8
__________________________________________________________________________
Logarithmic viscosity (30.
degree.
C.
)
0.
48 0.
40 0.
41 0.
34
0.
50 1.
13 1.
26 1.
08
Film-forming property
Excellent
Excellent
Excellent
Excellent
Excellent
Excellent
Excellent
Excellent
Solubility in NMP (wt %)
>20 >20 >20 >20 >20 >20 >20 >20
Thermodecomposition-initiating
307 310 305 282 315 312 308 316
temperature (.
degree.
C.
)
Photo-
Photo-
Thickness of
6.
7 7.
5 8.
0 4.
7 8.
2 45 53 42
setting
sensi-
film (.
mu.
)
property
tivity
Quantity
0.
042
0.
08 0.
17 4.
0 0.
084
0.
13 0.
25 0.
19
of irradiated
actinic rays
(J/cm.
sup.
2)
Resolving power Good Good Good Good Good Good Good Good
__________________________________________________________________________
1.
An organic solvent-soluble photosensitive polyamide resin comprising a polycondensation product of an aromatic dicarboxylic acid component consisting of at least one member selected from the group consisting of aromatic carboxylic acids and acid halides thereof with an aromatic diamine component consisting of 10 to 100 molar % of at least one member selected from the group consisting of diamino chalcone compounds and aromatic diamine compounds of the formula ##STR12## wherein X represents a divalent radical selected from the group consisting of --CO--O-- and --CH



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