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 Photosensitive composition with 4-azido-2'-methoxychalcone

Details
Inventors: Koibuchi, Shigeru; Isobe, Asao; Makino, Daisuke;
Assignee: Hitachi Chemical Co., Ltd. (Tokyo, JP); Hitachi, Ltd. (Tokyo, JP)
Primary Examiner: Bowers, Jr.; Charles L.
Assistant Examiner:
Attorney, Agent or Firm: Antonelli, Terry & Wands

4'-Azidobenzal-2-methoxyacetophenone is an excellent photosensitive compound and can give a photosensitive composition together with an alkaline-aqueous-solution-soluble polymer which can be insolubilized in an alkaline aqueous solution by photochemical curing with 4'-azidobenzal-2-methoxyacetophenone, and if necessary together with an organic solvent, said composition showing a very small change in viscosity with the lapse of long time.

DETAILED DESCRIPTION An object of this invention is to provide an azide compound which has excellent solubility in a solvent as a negative type of photosensitive compound and can form, in combination with a photosensitive polymer, a composition which exhibits a very small viscosity change with the lapse of time and a process for producing the azide compound.
Another object of the invention is to provide a photosensitive composition comprising a photosensitve compound exhibiting highly improved solubility for a solvent and a polymer which is soluble in an aqueous alkaline solution but can be insolubilized in an alkaline aqueous solution by photochemical curing with the photosensitive compound, said photosensitive composition being particularly improved in showing little viscosity change with the lapse of time.
This invention provides 4'-azidobenzal-2-methoxyacetophenone, which is represented by the formula: ##STR1## and a process for producing the same.
Further, this invention also provides a photosensitive composition comprising (a) 4'-azidobenzal-2-methoxyacetophenone represented by the formula: ##STR2## aqueous-solution-soluble polymer which can be insolubilized in an alkaline aqueous solution by photochemical curing with the component (a).



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