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 Photosensitive members and a process for forming patterns using the same

Details
Inventors: Tachikawa, Hiromichi; Takahashi, Yohnosuke; Shinozaki, Fumiaki; Ikeda, Tomoaki;
Assignee: Fuji Photo Film Co., Ltd. (Kanagawa, JP)
Primary Examiner: Bowers; Charles L.
Assistant Examiner:
Attorney, Agent or Firm: Sughrue, Mion, Zinn, Macpeak & Seas

A photosensitive member comprising a photosensitive layer containing an o-quinonediazide compound as a photosensitive agent and an additive, characterized in that the additive is selected from a group consisting of quinone compounds and aromatic ketone compounds, and a method for forming an image using the same.

DETAILED DESCRIPTION OF THE INVENTION The o-quinonediazide compound used in the present invention must have at least one o-quinonediazide moiety in its molecular structure, and exhibits an increased solubility in alkaline solutions when irradiated with actinic radiation.
Such compounds are described in detail in, for example, J.
Kosar, Light-Sensitive Systems, John Wiley & Sons, Inc.
(1965).
Among those with various chemical structures, particularly preferred are the o-benzo- and o-naphthoquinonediazide sulfonic acid esters of a variety of hydroxyl compounds, including the following representative examples: 2,2'-dihydroxydiphenyl-bis-[naphthoquinone-1,2-diazide-5-sulfonic acid ester], 2,2',4,4'-tetrahydroxydiphenyl-tetra[naphthoquinone-1,2-diazide-5-sulfonic acid ester], 2,3,4-trioxybenzophenone-bis[naphthoquinone-1,2-diazide-5-sulfonic acid ester], etc.
One can also employ the naphthoquinone-1,2-diazide-5-sulfonic acid ester of the polyhydroxybenzene resulting from the condensation polymerization of acetone and pyrogallol which is set forth in Japanese Patent Publication No.
28403/68 (corresponding to U.
S.
Pat.
No.
3,635,709).
The quinone compounds most characteristic of the present invention are an anthraquinone such as anthraquinone, 1-methylanthraquinone, 2-methylanthraquinone, 2-t-butylanthraquinone, 1-acetylamino-4-nitroanthraquinone, 1,2-benzanthraquinone, 2,3-triazolylanthraquinone, etc.
; and a phenanthraquinone such as phenanthraquinone, 1-methylphenanthraquinone, benzphenanthraquinone, etc.
Suitable examples of the aromatic ketone compounds used in the present invention are perinaphthenone, xanthone, thioxanthone, benzanthrone, 3-chlorobenzanthrone, naphthofuranone, 4-phenylnaphthofuranone, indenone, 2,3-diphenylindenone, benzophenone, benzalacetophenone, etc.
The suitable amount of the above-cited compounds is about 0.
005 to 1 part by weight and more preferably about 0.
01 to 0.
5 part by weight per part by weight of the o-quinonediazide compound.
The photosensitive resin composition prepared in accordance with the present invention can further contain a number of additives such as a pigment (e



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