|
|
Method for manufacturing semiconductor device
It is an object of the present invention to provide a method for manufacturing a semiconductor device which solves the above-mentioned problems and with which a GaAs MESF...
|
|
|
Planar interconnect for integrated circuits
It is an object of the subject invention to provide an integrated circuit having a dense multilayer metallization. More specifically, it is an object of this invention ...
|
|
|
Logic circuit using vertically stacked heterojunction field effect transistors
The advantages of the present invention are achieved by a heterojunction field effect transistor structure having vertically stacked complementary devices. A P-channel ...
|
|
|
Method of making substantially linear field-effect transistor
The device and the method of making the same discussed in this application has substantial commonality with the devices, and method of making those devices, as ...
|
|
|
Method of making a III-V complementary heterostructure device with compatible non-gold ohmic contacts
Briefly stated, the scope of the present invention encompasses a III-V complementary semiconductor device employing compatible ohmic contacts. Specifically, a preferred ...
|
|
|
SiC/111-V-nitride heterostructures on SiC/SiO.sub.2 /Si for optoelectronic devices
These problems and needs will be met in accordance with a preferred embodiment of the invention by converting 100% of a 100-500 .ANG. layer of Si of a silicon-on-...
|
|
|
Separation of thin films from transparent substrates by selective optical processing
The invention may be summarized as a method of transferring a crystalline film from a growth substrate to an acceptor substrate. The film of one composition is grown on ...
|
|
|
Apparatus comprising refractive means for elections
OF SOME EXEMPLARY EMBODIMENTS Before describing some currently preferred embodiments we will derive expressions describing the effect of a potential step on the ...
|
|
|
Nonvolatile ferroelectric memory and a method of manufacturing the same
Therefore, the present invention is directed to solve the problems of the conventional FRAM and is to provide a nonvolatile ferroelectric memory device having SWL ...
|
|
|
Filamentary electron-emission device having self-aligned gate or/and lower conductive/resistive region
What is claimed is: 1. A structure comprising: a substrate for providing structural support; a lower electrically conductive region comprising a group of generally ...
|