Home | Links | Contact Us | More About Intellectual Property | Bookmark
Search patents:
Home Quantum Computing Semiconductor-laser-device

 Plasma processing method for improving a package of a semiconductor device
An object of the present invention is to provide, with due consideration to the drawbacks of such ...


 Method of electron beam exposure
One object of this invention is to provide a method of electron beam exposure in which, when a ...


 Device for recognizing the impact site of a charge carrier beam on a target
The invention is therefore based on the task of obtaining an actual position signal of the impact ...


 Method for dry etching vias in integrated circuit layers
OF THE DRAWINGS Referring to FIG. 1, a schematic representation of an etching apparatus according ...


 Process for forming a buried drain or collector region in monolithic semiconductor devices
The process in accordance with the invention aims at overcoming the above drawbacks. A first ...


 Golf ball
OF THE INVENTION The present invention is directed to improved core construction and several ...


 Optoelectronic switching and display device with porous silicon
It is a principal object of the present invention to overcome the above shortcomings by providing a ...


 Method of forming porous silicon
It is an object of the present invention to provide a process for manufacturing porous silicon ...


 Lightweight neutron detector
What is claimed is: 1. In a neutron detector including a metallic encasement containing a neutron ...


 Method of forming a salicided self-aligned metal oxide semiconductor device using a disposable silicon nitride spacer
A method of fabricating a SALICIDED complementary metal oxide semiconductor utilizing a very thin ...


 Semiconductor laser device

Details
Inventors: Morimoto, Taiji; Yamaguchi, Masahiro; Kaneiwa, Shinji; Hayashi, Hiroshi; Kawanishi, Hidenori;
Assignee: Sharp Kabushiki Kaisha (Osaka, JP)
Primary Examiner: Sikes; William L.
Assistant Examiner: Epps; Georgia Y.
Attorney, Agent or Firm: Irell & Manella

A semiconductor laser device comprising an active layer that constitutes a laser-oscillating resonator, and an inner-striped channel in the resonating direction, light from the active layer being absorbed at both edges of the striped channel, resulting in an optical waveguide within the active layer, wherein the amount of light to be absorbed at both edges of the striped channel in the vicinity of at least one of the light-emitting facets is smaller than that to be absorbed at both edges of the striped channel inside of the light-emitting facets.

DETAILED DESCRIPTION What is claimed is: 1.
In a semiconductor laser device, the combination of an active layer that constitutes a laser-oscillating resonator, and an inner-striped channel formed on a substrate in the resonating direction, light from said active layer being absorbed at both edges of said striped channel, resulting in an optical waveguide within said active layer, wherein the composition ratio of the mixed crystal constituting the edges of said striped channel in the vicinity of at least one of the light-emitting facets is different from that of the mixed crystal constituting the edges of said striped channel inside of the light-emitting facets, so that the amount of light to be absorbed at both edges of said striped channel in the vicinity of at least one of the light-emitting facets is smaller than that to be absorbed at both edges of said striped channel inside of the light-emitting facets.
2.
An apparatus according to claim 1, wherein said mixed crystal constituting the edges of said striped channel in the vicinity of at least one of the light-emitting facets is GaAlAs and said mixed crystal constituting the edges of said striped channel inside of the light-emitting facets is GaAs.




Description:
BACKGROUND OF THE INVENTION 1.
Field of the invention: This invention relates to a semiconductor laser device that suppresses the generation of heat on at least one light-emitting facet.
2.
Description of the prior art: Conventional semiconductor laser devices are classified into two groups, one of which is of a gain guided-type and the other of which is of an index guided-type, based on the optical waveguiding mechanism.
The index guided semiconductor laser devices are more useful from the practical viewpoint, because of the stability of the transverse mode that is important in practical use.
A number of structures for index guided semiconductor laser devices have been developed.
Especially, inner stripe semiconductor laser devices with a channeled substrate have been put into practical use because of the ease of their manufacture and their high yield



Related patents
  Optical fiber cable provided with stabilized waterblocking material
Referring now to FIGS. 1 and 2, there is shown a communications cable which may incorporate the improved filling material of the present invention and which is ...
  Geometrical control of device corner threshold
It is therefore an object of the present invention to provide a technique of adjustment of corner conduction in a field effect transistor which is independent of the ...
  Universal frequency synthesizer
OF THE INVENTION In the accompanying drawing, which forms a part of the specification and are to be read in conjunction therewith and in which like reference numerals ...
  Multi-layer reflector for electroluminescent device
A multi-layer reflector is utilized on at least one facet surface of a semiconductor electroluminescent device capable of optical radiation emission in the wavelength ...
  Single filament semiconductor laser with large emitting area
A semiconductor laser includes a body of semiconductor material having a substrate with a pair of spaced, substantially parallel grooves in a surface thereof. A first ...
  Semiconductor laser having a doped surface zone
What is claimed is: 1. A semiconductor laser having a semiconductor body comprising a resonator and a first passive semiconductor layer of a first coductivity type, an ...
  Planar epitaxial refill using liquid phase epitaxy
We claim: 1. A method of refilling grooves in a silicon wafer of predetermined conductivity type by epitaxial growth of silicon from the liquid phase, comprising: ...
  Semiconductor integrated circuit device with a high tolerance against abnormally high input voltage
I claim: 1. A semiconductor integrated device having a high tolerance against abnormally high input voltages, comprising: a semiconductor substrate having a first ...
  Electron beam enhanced surface modification for making highly resolved structures
Against the described background, it is therefore a general object of the present invention to provide a method of forming submicron structures, especially those ...
  ***WITHDRAWN PATENT AS PER THE LATEST USPTO WITHDRAWN LIST*** *** NO IMAGES AVAILABLE***
Description:...

0.104

Archive: All patents - Links

Copyright (c)2006 Eipa-patents.org - All rights reserved