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Semiconductor laser having a doped surface zone
What is claimed is: 1. A semiconductor laser having a semiconductor body comprising a resonator and a first passive semiconductor layer of a first coductivity type, an ...
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Planar epitaxial refill using liquid phase epitaxy
We claim: 1. A method of refilling grooves in a silicon wafer of predetermined conductivity type by epitaxial growth of silicon from the liquid phase, comprising: ...
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Semiconductor integrated circuit device with a high tolerance against abnormally high input voltage
I claim: 1. A semiconductor integrated device having a high tolerance against abnormally high input voltages, comprising: a semiconductor substrate having a first ...
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Electron beam enhanced surface modification for making highly resolved structures
Against the described background, it is therefore a general object of the present invention to provide a method of forming submicron structures, especially those ...
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***WITHDRAWN PATENT AS PER THE LATEST USPTO WITHDRAWN LIST*** *** NO IMAGES AVAILABLE***
Description:...
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Plasma processing method for improving a package of a semiconductor device
An object of the present invention is to provide, with due consideration to the drawbacks of such conventional devices, an electronic device in which the decrease in ...
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Method of electron beam exposure
One object of this invention is to provide a method of electron beam exposure in which, when a resist film on a substrate is exposed with an electron beam, the ...
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Device for recognizing the impact site of a charge carrier beam on a target
The invention is therefore based on the task of obtaining an actual position signal of the impact point of an electron beam on a target which is independent of the melt ...
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Method for dry etching vias in integrated circuit layers
OF THE DRAWINGS Referring to FIG. 1, a schematic representation of an etching apparatus according to the present invention is shown and is generally designated 100. A...
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Process for forming a buried drain or collector region in monolithic semiconductor devices
The process in accordance with the invention aims at overcoming the above drawbacks. A first innovative process embodiment comprises the following steps: growing on a ...
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