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Latest patents Results: 421-450 of 2287
Page 15 / 77 « First  <  11 12 13 14 15 16 17 18 19 20  >  Last »
Josephson junction device formed of oxide superconductor and process for preparing the same
Accordingly, it is an object of the present invention to provide an improved step type Josephson junction device composed of an oxide superconductor material, which has overcome the above mentioned de... Read More
Inventors: Tanaka, Saburo; Matsuura, Takashi; Itozaki, Hideo;, Assignee: Sumitomo Electric Industries, Ltd. (Osaka, JP)
Superconducting element
It is, therefore, an object of the present invention to provide a superconducting element having a high Ic.times.Rn value. Another object of the present invention is to provide a superconducting eleme... Read More
Inventors: Odagawa, Akihiro; Enomoto, Youichi; Yoshikawa, Shuuichi;, Assignee: International Superconductivity Technology Center (JP); Matsushita Electric Industrial Co., Ltd. (JP); Sanyo Electric Co., Ltd. (JP)
Electronic metering equipment system
In one aspect, the present invention includes the combination of an electronic audio system with a module port, a module, and a microphone. The electronic audio system includes at least one speaker an... Read More
Inventors: Stein, Per;, Assignee: Telefonaktiebolaget L/M Ericsson (publ) (Stockholm, SE)
Process for manufacturing semiconductor devices containing microbridges
The object of the present invention is to provide a process for manufacturing semiconductor devices having an SOI structure which exhibits good interface properties between the insulating film and the... Read More
Inventors: Moniwa, Masahiro; Warabisako, Terunori; Sunami, Hideo;, Assignee: Hitachi, Ltd. (Tokyo, JP)
Superconducting contact structure
It is an object of the present invention to provide a good superconducting contact between an oxide superconductor and a metal superconductor. In order to achieve the above object of the present inven... Read More
Inventors: Hidaka, Mutsuo;, Assignee: NEC Corporation (JP)
Extremely sensitive super conducting quantum interference device constructed as a double-helix array
The described invention is briefly summarized as a means for increasing the sensitivity of Josephson Junction Cryogenic Magnetometers by unique design and construction of DC SQUID arrays. The SQUIDS a... Read More
Inventors: Hinton, George F.;, Assignee: The United States of America as represented by the Secretary of the Navy (Washington, DC)
Noise canceling high-sensitive magnetometer
It has been desired for the SQUID magnetometer to detect magnetic flux with high sensitivity and low noises. In other words, the object of this invention is to improve the sensivity of the SQUID magne... Read More
Inventors: Nakane, Hideaki; Cubillos, Juan C.; Goto, Eiichi;, Assignee: Research Development Corporation of Japan (Tokyo, JP); Nakane; Hideaki (Tokyo, JP)
Lubricating compositions with improved thermal stability and limited slip performance
We claim: 1. A lubricating composition comprising a major amount of an oil of lubricating viscosity, (A) an hydrocarbyl phosphite, wherein each hydrocarbyl group is saturated and independently contain... Read More
Inventors: Bigelow, Sean S.; Gapinski, Richard E.; Rizvi, Syed Q. A.;, Assignee: The Lubrizol Corporation (Wickliffe, OH)
Method for forming submicroscopic patterns
Accordingly, it is an object of the present invention to overcome the above-mentioned problems encountered in the prior art and to provide a method for forming submicroscopic patterns, which results i... Read More
Inventors: Kim, Hyeong S.;, Assignee: Hyundai Electronics Industries Co. Ltd. (Kyoungki-do, KR)
Self aligned contacts
There is an increasing need in the industry for an improved self aligned contact fabrication process for ULSI applications. In particular, there is a need for an improved self aligned contact fabricat... Read More
Inventors: Doan, Trung T.;, Assignee: Micron Technology, Inc. (Boise, ID)
Evaluating the lifetime and reliability of a TFT in a stress test using gate voltage and temperature measurements
In view of the problems of the prior art described above, an object of the present invention is to provide a method of evaluating reliability of an individual TFT taking into consideration variation o... Read More
Inventors: Maeda, Shigenobu;, Assignee: Mitsubishi Denki Kabushiki Kaisha (Tokyo, JP)
Nuclear magnetic resonance quantum computing method with improved solvents
What is claimed is: 1. A method for increasing the clock speed of a nuclear magnetic resonance quantum computer comprising immersing quantum computer solute molecules in a liquid crystal solvent to en... Read More
Inventors: Chuang, Isaac Liu; Sherwood, Mark Hull; Yannoni, Costantino Sheldon;, Assignee: International Business Machines Corporation (Armonk, NY)
Electron tuned quantum well device
Having thus described our invention, what we claim as new and desire to secure by Letters Patent is: 1. In a signal translator which includes a single conducting path of given length on the surface of... Read More
Inventors: Fowler, Alan B.; Timp, Gregory L.;, Assignee: International Business Machines Corporation (Armonk, NY)
Method of making a universal quantum dot logic cell
In accordance with the teachings of the present invention, a quantum effect logic device is provided which comprises a row of quantum dots separated by vertical heterojunction tunneling barriers. The ... Read More
Inventors: Randall, John N.; Frazier, Gary A.;, Assignee: Texas Instruments Incorporated (Dallas, TX)
Semiconductor thyristor switching device and power converter using same
The present invention is made under the consideration of the above-mentioned problems. An object of the present invention is to provide a semiconductor device which has both the characteristics of a h... Read More
Inventors: Mizoguchi, Tetsuo; Nagasu, Masahiro; Kobayashi, Hideo; Yatsuo, Tsutomu;, Assignee: Hitachi, Ltd. (Tokyo, JP)
Paper device and method for photographic printer
In view of the foregoing, an object of the invention is to provide a paper transport system for a photographic printer wherein change-over between the paper feeding and the paper rewinding can be reli... Read More
Inventors: Ozawa, Yoshio; Matsumoto, Takashi; Saito, Kimitoshi;, Assignee: Fuji Photo Film Co., Ltd. (Kanagawa, JP)
Cassette for supplying webs of photosensitive material to copying machines
What is claimed is: 1. Cassette for storage of rolls of convoluted web-shaped photosensitive material and for dispensing of such material, comprising a housing having an internal chamber, means for ro... Read More
Inventors: Nagel, Erich; Benker, Gerhard;, Assignee: AGFA-Gevaert Aktiengesellschaft (Leverkusen, DE)
Clutch mechanism and webbing winding device
In consideration of such facts, an object of the present invention is to provide a clutch mechanism capable of transmitting the rotation force of a rotating member to a member to be rotated without ca... Read More
Inventors: Hori, Seiji; Nagata, Tomonori;, Assignee: Kabushiki Kaisha Tokai-Rika-Denki-Seisakusho (Aichi-ken, JP)
Electroless copper plating solution and process for formation of copper film
Therefore, a primary object of the present invention is to provide a high-speed electroless copper plating solution capable of easily initiating a stable reaction and providing a copper film having ex... Read More
Inventors: Kondo, Koji; Amakusa, Seiji; Murakawa, Katuhiko; Kojima, Katsuaki; Ishida, Nobumasa; Ishikawa, Junji; Ishikawa, Futoshi;, Assignee: Nippondenso Co. Ltd. (Kariya, JP)
Method for producing circuit board, for semiconductor package, having cavity for accommodating semiconductor element
Accordingly, an object of the present invention is to solve the above problems in the prior art, and provide a method for producing a circuit board for a semiconductor package, in which a short-circui... Read More
Inventors: Sato, Hiroaki; Ebe, Masayoshi;, Assignee: Shinko Electric Industries Co. (Nagano, JP)
Reduced size etching method for integrated circuits
In FIG. 1 reference numeral 11 designates a substrate which may consist essentially of, for example, silicon, epitaxial silicon, gallium arsenide, or another suitable material. Reference numerals 13 ... Read More
Inventors: Hills, Graham William;, Assignee: Lucent Technologies Inc (Murray Hill, NJ)
Process for producing an electrically conductive diffusion barrier at the metal/silicon interface of a MOS transistor
The object of the present invention is to overcome the abovementioned drawbacks by operating a process for producing an electrically conductive diffusion barrier at the metal/silicon interface of an M... Read More
Inventors: Vuillermoz, Bernard; Bakli, Mouloud; Straboni, Alain;, Assignee: France Telecom (Paris, FR)
Method of forming contacts in vias formed over interconnect layers
Accordingly, the present invention provides a method of fabricating a semiconductor device incorporating a via and an interconnect layer of aluminium or aluminium alloy, the method comprising the step... Read More
Inventors: Wyborn, Graeme M.; Nicholls, Howard C.;, Assignee: SGS-Thomson Microelectronics Ltd. (GB)
Solar cell manufacturing method
An object of the present invention is to provide a method of manufacturing a solar cell whose energy conversion efficiency is much higher than that of conventional solar cells. Another object of the p... Read More
Inventors: Koiwai, Sakae; Asaoka, Keizo; Shirasawa, Katsuhiko; Watanabe, Hiroyuki; Honda, Junichi;, Assignee: Japan Solar Energy Co., Ltd. (JP)
***WITHDRAWN PATENT AS PER THE LATEST USPTO WITHDRAWN LIST*** *** NO IMAGES AVAILABLE***
Description:... Read More
Inventors: , Assignee:
Process of forming a tri-layer titanium coating for an aluminum layer of a semiconductor device
The present invention provides a novel tri-layer titanium coating for an aluminum layer of a semiconductor device. The tri-layer titanium coating is comprised of a first titanium nitride layer deposit... Read More
Inventors: Bost, Melton C.; Yang, Simon; Yen, Yeochung; Baldo, Jim; Greenebaum, Barbara;, Assignee: Intel Corporation (Santa Clara, CA)
Plasma etch process
It is an object of the invention to provide an etch process for making high aspect ratio holes in oxides of silicon, and/or glass. It is a further object to provide an etch process that has a high etc... Read More
Inventors: Gupta, Subhash; Chen, Susan H.;, Assignee: Advanced Micro Devices, Inc. (Sunnyvale, CA)
Self-aligned silicide manufacturing method
It is therefore an object of this invention to provide an improved self-aligned silicide manufacturing method in which, prior to the formation of the heat resistant metallic layer on top of the silico... Read More
Inventors: Jenq, Jason; Chen, Tung-Po;, Assignee: United Microelectronics Corporation (TW)
Method of making semiconductor device with metal silicide nitride layer and metal silicide
The present invention is intended to overcome the above described disadvantages of the conventional techniques. Therefore it is an object of the present invention to provide a process for formation of... Read More
Inventors: Lee, Chang-Jae; Kim, Chang-Reol;, Assignee: LG Semicon Co., Ltd. (Cheongju, KR)
Anti-shear method and system for semiconductor wafer removal
It is an object of the present invention to provide a system and method that substantially reduces, or eliminates the sticking of semiconductor wafers on a Chemical Mechanical Polishing machine polish... Read More
Inventors: Pollock, John J.;, Assignee: Cypress Semiconductor Corporation (San Jose, CA)
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